Mr. Koutarou Sho Profile

Koutarou Sho

at Toshiba Corp

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 15 March 2016 Paper

Mask defect printability in the Self-Aligned Quadruple Patterning (SAQP) process

Ken Furubayashi, Koutarou Sho, Seiro Miyoshi, Shinji Yamaguchi, Kazunori Iida, Satoshi Usui, Tsuyoshi Morisaki, Naoki Sato, Hidefumi Mukai

Proceedings Volume 9780, 97800O (2016) https://doi.org/10.1117/12.2218416

KEYWORDS: Photomasks, Optical lithography, Lithography, Double patterning technology, Scanners, Semiconducting wafers, Reactive ion etching, Metals, Semiconductors, Lenses, Opacity, Etching, Critical dimension metrology, Anisotropic etching, Photoresist materials

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Proceedings Article | 16 April 2011 Paper

The resist-core spacer patterning process for fabrication of 2xnm node semiconductor devices

Koutarou Sho, Tomoya Oori, Kazunori Iida, Katsutoshi Kobayashi, Keisuke Kikutani, Katsumi Yamamoto, Fumiki Aiso, Kentaro Matsunaga, Eishi Shiobara, Koji Hashimoto

Proceedings Volume 7972, 79720C (2011) https://doi.org/10.1117/12.877616

KEYWORDS: Etching, Photomasks, Lithography, Optical lithography, Semiconductors, Scanning electron microscopy, Photoresist processing, Silica, Double patterning technology, Critical dimension metrology

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Proceedings Article | 1 April 2009 Paper

Feasibility study of non-topcoat resist for 22nm node devices

Koutaro Sho, Hirokazu Kato, Katsutoshi Kobayashi, Kazunori Iida, Tomoya Ori, Daizo Muto, Tsukasa Azuma, Shinichi Ito, Tomoharu Fujiwara, Yuuki Ishii, Yukio Nishimura, Takanori Kawakami, Motoyuki Shima

Proceedings Volume 7273, 72733B (2009) https://doi.org/10.1117/12.812475

KEYWORDS: Polymers, Photoresist processing, Semiconducting wafers, Line width roughness, Thin film coatings, Lithography, Scanners, Chemical species, Defect inspection, Immersion lithography

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Proceedings Article | 1 April 2008 Paper

Patterning strategy and performance of 1.3NA tool for 32nm node lithography

Shoji Mimotogi, Masaki Satake, Yosuke Kitamura, Kazuhiro Takahata, Katsuyoshi Kodera, Hiroharu Fujise, Tatsuhiko Ema, Koutaro Sho, Kazutaka Ishigo, Takuya Kono, Masafumi Asano, Kenji Yoshida, Hideki Kanai, Suigen Kyoh, Hideaki Harakawa, Akiko Nomachi, Tatsuya Ishida, Katsura Miyashita, Soichi Inoue

Proceedings Volume 6924, 69240M (2008) https://doi.org/10.1117/12.772201

KEYWORDS: Lithography, Optical lithography, Scanners, SRAF, Semiconducting wafers, Lithographic illumination, Metals, Photomasks, Semiconductors, Logic devices

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Proceedings Article | 31 March 2008 Paper

Immersion resist process for 32-nm node logic devices

Tatsuhiko Ema, Koutaro Sho, Hiroki Yonemitsu, Yuriko Seino, Hiroharu Fujise, Akiko Yamada, Shoji Mimotogi, Yosuke Kitamura, Satoshi Nagai, Kotaro Fujii, Takashi Fukushima, Toshiaki Komukai, Akiko Nomachi, Tsukasa Azuma, Shinichi Ito

Proceedings Volume 6923, 69230E (2008) https://doi.org/10.1117/12.771008

KEYWORDS: Photoresist processing, Logic devices, Reflectivity, Photomasks, System on a chip, Etching, Transparency, Materials processing, Immersion lithography

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Proceedings Article | 26 March 2008 Paper

Sub-45nm resist process using stacked-mask process

Yuriko Seino, Katsutoshi Kobayashi, Koutaro Sho, Hirokazu Kato, Seiro Miyoshi, Keisuke Kikutani, Junko Abe, Hisataka Hayashi, Tokuhisa Ohiwa, Yasunobu Oonishi, Shinichi Ito

Proceedings Volume 6923, 69232O (2008) https://doi.org/10.1117/12.771840

KEYWORDS: System on a chip, Etching, Reactive ion etching, Reflectivity, Hydrogen, Fluorine, Lithography, Photoresist processing, Silica, Scanning electron microscopy

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Proceedings Article | 27 March 2007 Paper

Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2

Shoji Mimotogi, Fumikatsu Uesawa, Makoto Tominaga, Hiroharu Fujise, Koutaro Sho, Mikio Katsumata, Hiroki Hane, Atsushi Ikegami, Seiji Nagahara, Tatsuhiko Ema, Masafumi Asano, Hideki Kanai, Taiki Kimura, Masaaki Iwai

Proceedings Volume 6520, 652008 (2007) https://doi.org/10.1117/12.711049

KEYWORDS: Lithography, Immersion lithography, Photomasks, Critical dimension metrology, Phase shifting, Lithographic illumination, Phase shifts, Logic, Metals, Semiconductors

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Proceedings Article | 12 May 2005 Paper

Optical lithography technologies for 45-nm node CMOS

Shoji Mimotogi, Fumikatsu Uesawa, Suigen Kyoh, Hiroharu Fujise, Eishi Shiobara, Mikio Katsumata, Hiroki Hane, Tomohiro Sugiyama, Koutaro Sho, Maki Miyazaki, Kazuhiro Takahata, Hideki Kanai, Kazuya Sato, Kohji Hashimoto

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600948

KEYWORDS: Lithography, Photomasks, Critical dimension metrology, Lens design, Photoresist processing, CMOS technology, Optical lithography, Metals, Logic, Semiconductors

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Proceedings Article | 4 May 2005 Paper

Effect of post development process for resist roughness

Koutarou Sho, Tsuyoshi Shibata, Eishi Shiobara, Shinichi Ito

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599209

KEYWORDS: Line width roughness, Photoresist processing, Image processing, Critical dimension metrology, Ultraviolet radiation, Scanning electron microscopy, Reactive ion etching, Polymers, Lithography, Absorption

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Proceedings Article | 4 May 2005 Paper

Influence of the watermark in immersion lithography process

Daisuke Kawamura, Tomoyuki Takeishi, Koutarou Sho, Kentarou Matsunaga, Naofumi Shibata, Kaoru Ozawa, Satoru Shimura, Hideharu Kyoda, Tetsu Kawasaki, Seiki Ishida, Takayuki Toshima, Yasunobu Oonishi, Shinichi Ito

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599314

KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Digital watermarking, Immersion lithography, Silicon, Photoresist processing, Thin film coatings, Coating, Liquids, Water

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Proceedings Article | 12 June 2003 Paper

Application of reversed pattern transfer process for sub-90-nm technology

Koutaro Sho, Tsuyoshi Shibata, Hirokazu Kato, Junko Abe, Yoshinobu Ohnishi, Kazuhiko Urayama

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485089

KEYWORDS: Etching, Reactive ion etching, Silicon, Photoresist processing, Scanning electron microscopy, Lithography, Photomasks, Coating, Thin film coatings, Image processing

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Proceedings Article | 24 July 2002 Paper

Material and process development of tri-level resist system in KrF and ArF lithography

Tsuyoshi Shibata, Seiji Nakagawa, Yasuhiko Sato, Koutaro Sho, Hisataka Hayashi, Junko Abe

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474278

KEYWORDS: Lithography, Reflectivity, Reactive ion etching, Photoresist processing, Etching, Deep ultraviolet, Carbon, Scanning electron microscopy, Photoresist materials, Imaging systems

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Proceedings Article | 27 April 1999 Paper

High-accuracy development monitoring technology

Shinichi Ito, Kei Hayasaki, Kenji Kawano, Koutaro Sho, Shoji Mimotogi, Fumio Komatsu, Katsuya Okumura

Proceedings Volume 3743, (1999) https://doi.org/10.1117/12.346907

KEYWORDS: Semiconducting wafers, Process control, Image processing, Critical dimension metrology, Process engineering, Control systems, Image analysis, Deep ultraviolet, CCD cameras, Microelectronics

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Showing 5 of 13 publications

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