Mr. Lior Akerman Profile

Lior Akerman

at Applied Materials Inc

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Author

Publications (2)

SPIE Journal Paper | 1 October 2006

Investigation of possible ArF resist slimming mechanisms

Lior Akerman, Guy Eytan, Ryusuke Uchida, Satoshi Fujimura, Takeyoshi Mimura

JM3, Vol. 5, Issue 04, 043005, (October 2006) https://doi.org/10.1117/12.10.1117/1.2399525

KEYWORDS: Semiconducting wafers, Photoresist materials, Scanning electron microscopy, Critical dimension metrology, Chemistry, Electron microscopes, Lead, Molecules, Process control, Printing

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Proceedings Article | 10 May 2005 Paper

Examination of possible primary mechanisms for 193nm resist shrinkage

Lior Akerman, Guy Eytan, Ryusuke Uchida, Satoshi Fujimura, Takeyoshi Mimura

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599934

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Photoresist materials, Line edge roughness, Critical dimension metrology, Chemistry, Lead, Coating, Electron beam lithography, Electron microscopes

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