Michael J. Boruszewski
at Univ of Wisconsin-Madison
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 March 2006 Paper
Proceedings Volume 6151, 61511J (2006) https://doi.org/10.1117/12.657659
KEYWORDS: Photomasks, Picosecond phenomena, Silicon carbide, Mask making, Metrology, Electron beam lithography, Projection lithography, Image processing, 3D modeling, Etching

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