Mr. Michael Hoffman Profile

Michael Hoffman

Business Development

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Publications (3)

Proceedings Article | 1 April 2008 Paper

A new robust process window qualification (PWQ) technique to perform systematic defect characterization to enlarge the lithographic process window using a die-to-database verification tool (NGR2100)

Tadashi Kitamura, Toshiaki Hasebe, Kazufumi Kubota, Futoshi Sakai, Shinichi Nakazawa, Michael Hoffman, Masahiro Yamamoto, Masahiro Inoue

Proceedings Volume 6925, 692519 (2008) https://doi.org/10.1117/12.772706

KEYWORDS: Lithography, Inspection, Optical proximity correction, Defect detection, Bridges, Optical inspection, Scanning electron microscopy, Semiconducting wafers, Semiconductors, Design for manufacturability

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Proceedings Article | 5 April 2007 Paper

Die-to-database verification tool for detecting CD errors, which are caused by OPC features, by using mass gate measurement and layout information

Tadashi Kitamura, Toshiaki Hasebe, Kazufumi Kubota, Futoshi Sakai, Shinichi Nakazawa, David Lin, Michael Hoffman, Masahiro Yamamoto, Masahiro Inoue

Proceedings Volume 6518, 651834 (2007) https://doi.org/10.1117/12.712413

KEYWORDS: Critical dimension metrology, Error analysis, Optical proximity correction, Statistical analysis, Inspection, Computer aided design, Optical design, Photomasks, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 20 October 2006 Paper

Introduction of a die-to-database verification tool for mask geometry NGR4000

Michael Hoffman, Tadashi Kitamura, Kazufumi Kubota, Toshiaki Hasebe, Shinichi Nakazawa, Toshifumi Tokumoto, Masatoshi Tsuneoka, Masahiro Yamamoto, Masahiro Inoue

Proceedings Volume 6349, 634940 (2006) https://doi.org/10.1117/12.684984

KEYWORDS: Photomasks, Scanning electron microscopy, Critical dimension metrology, Distortion, Inspection, Metrology, Optical proximity correction, Optical inspection, Error analysis, Electron microscopes

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