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Michael Rattner
Process Engineer/MEMS Specialist at AdvancedMEMS
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Publications (1)
Proceedings Article | 30 March 2007 Paper
Novel developers for positive tone EUV photoresists
Geeta Sharma, Shalini Sharma, Michael Rattner, Robert Meagley, Masato Tanaka, Tsutomu Shimokawa, Hikaru Sugita, Tina Wang, Atsushi Shiota
Proceedings Volume 6519, 65190P (2007) https://doi.org/10.1117/12.712377
KEYWORDS: Standards development, Photoresist developing, Photoresist materials, Extreme ultraviolet lithography, Photoresist processing, Extreme ultraviolet, Polymers, Scanning electron microscopy, Semiconducting wafers, Solids
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