Dr. Michael Switkes Profile

Dr. Michael Switkes

Staff Member at MIT Lincoln Lab

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Author

Publications (14)

Proceedings Article | 15 March 2006 Paper

Studies of consequences of photo-acid generator leaching in 193nm immersion lithography

V. Liberman, M. Switkes, M. Rothschild, S. Palmacci, A. Grenville

Proceedings Volume 6154, 615416 (2006) https://doi.org/10.1117/12.659596

KEYWORDS: Contamination, Semiconducting wafers, Wafer-level optics, Particles, Capillaries, Silicon, Immersion lithography, Lithography, Optical components, Laser irradiation

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Proceedings Article | 12 May 2005 Paper

Long-term 193-nm laser irradiation of thin-film-coated CaF2 in the presence of H2O

V. Liberman, M. Switkes, M. Rothschild, S. Palmacci, J. Sedlacek, D. Hardy, A. Grenville

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601468

KEYWORDS: Thin film coatings, Laser irradiation, Thin films, Optical coatings, Birefringence, Metrology, Ellipsometry, Lithography, Ultraviolet radiation, Spectroscopic ellipsometry

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Proceedings Article | 12 May 2005 Paper

A 157-nm immersion microstepper

M. Switkes, T. Bloomstein, M. Rothschild, E. Arriola, T. Morrison

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602585

KEYWORDS: Lithography, Lens design, Semiconducting wafers, Photomasks, Liquids, Microfluidics, Actuators, Microfluidic imaging, Sensors, Immersion lithography

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SPIE Journal Paper | 1 January 2005

Simulation of the coupled thermal/optical effects for liquid immersion nanolithography

So-Yeon Baek, Alexander Wei, Daniel Cole, Gregory Nellis, Michael Yeung, Amr Abdo, Roxann Engelstad, Mordechai Rothschild, Michael Switkes

JM3, Vol. 4, Issue 01, 013002, (January 2005) https://doi.org/10.1117/12.10.1117/1.1858331

KEYWORDS: Semiconducting wafers, Liquids, Thermal effects, Microfluidics, Wafer-level optics, Refraction, Computational fluid dynamics, Optical lithography, Microfluidic imaging, Photomasks

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Proceedings Article | 28 May 2004 Paper

Scattering in liquid immersion lithography

Michael Switkes, Theodore Bloomstein, Roderick Kunz, Mordechai Rothschild, J. Ruberti, T. Shedd, Michael Yeung

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534194

KEYWORDS: Liquids, Scattering, Immersion lithography, Rayleigh scattering, Interfaces, Water, Scatter measurement, Raman scattering, Semiconducting wafers, Lithography

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SPIE Journal Paper | 1 January 2004

Transparent fluids for 157-nm immersion lithography

Roderick Kunz, Michael Switkes, Roger Sinta, Jane Curtin, Roger French, Robert Wheland, Chien-Ping Kao, Michael Mawn, Lois Lin, Paula Wetmore, Val Krukonis, Kara Williams

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1637366

KEYWORDS: Absorption, Immersion lithography, Liquids, Absorbance, Vacuum ultraviolet, Microfluidics, Water, Carbon monoxide, Oxygen, Chemical analysis

SPIE Journal Paper | 1 January 2004

Simulation study of process latitude for liquid immersion lithography

So-Yeon Baek, Daniel Cole, Mordechai Rothschild, Michael Switkes, Michael Yeung, Eytan Barouch

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1637365

KEYWORDS: Liquids, Photoresist materials, Binary data, Immersion lithography, Refraction, Thin films, Printing, Phase shifts, Optical lithography, Projection systems

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SPIE Journal Paper | 1 January 2004

Microfluidic simulations for immersion lithography

Alexander Wei, Gregory Nellis, Amr Abdo, Roxann Engelstad, Cheng-Fu Chen, Michael Switkes, Mordechai Rothschild

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1632500

KEYWORDS: Semiconducting wafers, Liquids, Microfluidics, Immersion lithography, Capillaries, Computational fluid dynamics, Fluid dynamics, Computer simulations, Calcium, Refraction

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Proceedings Article | 26 June 2003 Paper

Immersion liquids for lithography in the deep ultraviolet

Michael Switkes, Roderick Kunz, Roger Sinta, Mordechai Rothschild, Paula Gallagher-Wetmore, Val Krukonis, Kara Williams

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485329

KEYWORDS: Liquids, Absorbance, Water, Lithography, Immersion lithography, Optical lithography, Deep ultraviolet, Oxygen, Semiconducting wafers, Chemistry

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Proceedings Article | 26 June 2003 Paper

Preliminary microfluidic simulation for immersion lithography

Alexander Wei, Greg Nellis, Amr Abdo, Roxann Engelstad, Cheng-Fu Chen, Michael Switkes, Mordechai Rothschild

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.497495

KEYWORDS: Semiconducting wafers, Liquids, Immersion lithography, Computational fluid dynamics, Microfluidics, Fluid dynamics, Computer simulations, Water, Liquid lenses, Process modeling

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Proceedings Article | 26 June 2003 Paper

Simulation study of process latitude for liquid immersion lithography

So-Yeon Baek, Daniel Cole, Mordechai Rothschild, Michael Switkes, Michael Yeung, Eytan Barouch

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.504600

KEYWORDS: Liquids, Binary data, Immersion lithography, Photoresist materials, Photomasks, Refraction, Printing, Optical lithography, Thin films, Projection systems

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SPIE Journal Paper | 1 October 2002

Resolution enhancement of 157 nm lithography by liquid immersion

Michael Switkes, Mordechai Rothschild

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1502260

KEYWORDS: Liquids, Lithography, Immersion lithography, Semiconducting wafers, Resolution enhancement technologies, Wafer-level optics, Absorbance, Water, Refraction, Optical design

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Proceedings Article | 30 July 2002 Paper

Resolution enhancement of 157-nm lithography by liquid immersion

Michael Switkes, Mordechai Rothschild

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474568

KEYWORDS: Liquids, Lithography, Immersion lithography, Semiconducting wafers, Resolution enhancement technologies, Absorbance, Optical design, Water, Contamination, Imaging systems

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Proceedings Article | 5 July 2000 Paper

Interference lithography at 157 nm

Michael Switkes, Theodore Bloomstein, Mordechai Rothschild

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389007

KEYWORDS: Lithography, Spatial coherence, Optical lithography, Photoresist materials, Silicon, Deep ultraviolet, Line edge roughness, Photoresist processing, Mirrors, Laser sources

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Showing 5 of 14 publications

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