Mr. Osamu Nozawa Profile

Osamu Nozawa

at HOYA Corp

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 12 October 2021 Presentation + Paper

Precision phase angle control with transmissive etching stop film

Hiroaki Shishido, Osamu Nozawa, Ryo Ohkubo, Hitoshi Maeda, Masahiro Hashimoto

Proceedings Volume 11855, 118550O (2021) https://doi.org/10.1117/12.2600852

KEYWORDS: Etching, Silica, Transmission electron microscopy

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Proceedings Article | 24 March 2020 Presentation

Development of high reflective phase shift type absorber for future generation EUV mask blank (Conference Presentation)

Yohei Ikebe, Osamu Nozawa, Takahiro Onoue

Proceedings Volume 11323, 1132311 (2020) https://doi.org/10.1117/12.2550941

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Proceedings Article | 28 October 2015 Paper

High-durability phase-shift film with variable transmittance

Osamu Nozawa, Hiroaki Shishido, Takenori Kajiwara

Proceedings Volume 9635, 963517 (2015) https://doi.org/10.1117/12.2202596

KEYWORDS: Oxidation, Phase shifts, Transmittance, Molybdenum, Silicon, Photomasks, Humidity, Excimer lasers, Quartz, Optical lithography

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Proceedings Article | 29 September 2010 Paper

Advanced binary film for 193nm lithography extension to sub-32-nm node

Osamu Nozawa, Hiroaki Shishido, Masahiro Hashimoto, Yasushi Ohkubo, Hideaki Mitsui

Proceedings Volume 7823, 78230K (2010) https://doi.org/10.1117/12.866006

KEYWORDS: Photomasks, Tantalum, Reflectivity, Critical dimension metrology, Silicon, Etching, Binary data, Oxides, Chromium, Scanning transmission electron microscopy

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Proceedings Article | 30 October 2007 Paper

Recent performance of EUV mask blanks with low-thermal expansion glass substrates

Tsutomu Shoki, Takeyuki Yamada, Shouji Shimojima, Yuuki Shiota, Mitsuharu Tsukahara, Kesahiro Koike, Hiroaki Shishido, Osamu Nozawa, Toshiyuki Sakamoto, Morio Hosoya

Proceedings Volume 6730, 673015 (2007) https://doi.org/10.1117/12.748369

KEYWORDS: Extreme ultraviolet, Polishing, Reflectivity, Photomasks, Extreme ultraviolet lithography, Glasses, Inspection, Silicon, Molybdenum, Defect inspection

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Proceedings Article | 20 October 2006 Paper

Process development for EUV mask production

Tsukasa Abe, Akiko Fujii, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi, Tsutomu Shoki, Takeyuki Yamada, Osamu Nozawa, Ryo Ohkubo, Masao Ushida

Proceedings Volume 6349, 63493G (2006) https://doi.org/10.1117/12.692519

KEYWORDS: Etching, Reflectivity, Extreme ultraviolet, Photomasks, Silicon, Photoresist processing, Scanning electron microscopy, Dry etching, Defect inspection, Inspection

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Proceedings Article | 6 May 2005 Paper

Development of low damage mask making process on EUV mask with thin CrN buffer layer

Mitsuhiro Kureishi, Ryo Ohkubo, Morio Hosoya, Tsutomu Shoki, Noriyuki Sakaya, Hideo Kobayashi, Osamu Nozawa, Yoh-ichi Usui, Osamu Nagarekawa

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598613

KEYWORDS: Etching, Extreme ultraviolet, Multilayers, Reflectivity, Silicon, Photomasks, Atomic force microscopy, Dry etching, Scanning electron microscopy, Transmission electron microscopy

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Proceedings Article | 28 August 2003 Paper

Development of attenuating PSM shifter for F₂ and high-transmission ArF lithography

Osamu Nozawa, Yuki Shiota, Hideaki Mitsui, Toshiyuki Suzuki, Yasushi Ohkubo, Masao Ushida, Satoshi Yusa, Toshiharu Nishimura, Kenji Noguchi, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504047

KEYWORDS: Transmittance, Etching, Dry etching, Chromium, Photomasks, Fluorine, Inspection, Phase shifts, Lithography, Plasma

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Proceedings Article | 22 January 2001 Paper

Development of MoSi-based halftone phase-shift blank and mask fabrication for ArF lithography (Photomask Japamn 2000 Best Presentation Award)

Hideki Suda, Hideaki Mitsui, Osamu Nozawa, Hitoshi Ohtsuka, Megumi Takeuchi, Naoki Nishida, Yasushi Okubo, Masao Ushida

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410773

KEYWORDS: Photomasks, Lithography, Binary data, Scanning electron microscopy, Chromium, Laser irradiation, Inspection, Phase shifts, Halftones, Mask making

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Proceedings Article | 19 July 2000 Paper

Development of halftone phase-shift blank and mask fabrication for ArF lithography

Hideki Suda, Hideaki Mitsui, Osamu Nozawa, Hitoshi Ohtsuka, Megumi Takeuchi, Naoki Nishida, Yasushi Okubo, Masao Ushida

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392099

KEYWORDS: Photomasks, Lithography, Binary data, Halftones, Laser irradiation, Scanning electron microscopy, Mask making, Etching, Optical properties, Defect inspection

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Proceedings Article | 3 February 2000 Paper

Development of embedded attenuated phase-shifting mask (EAPSM) blanks for ArF lithography

Hideaki Mitsui, Osamu Nozawa, Hitoshi Ohtsuka, Megumi Takeuchi, Hideo Kobayashi, Masao Ushida

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377098

KEYWORDS: Transmittance, 193nm lithography, Photomasks, Lithography, Deep ultraviolet, Optical properties, Chemical lasers, Phase shifts, Laser irradiation, Reflectivity

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Showing 5 of 11 publications

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