CONFERENCE PROCEEDINGS
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Ryoichi Takasu
at Tokyo Ohka Kogyo Co Ltd
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Author
Publications (4)
Proceedings Article | 26 March 2010 Paper
Process feasibility investigation of freezing free litho-litho-etch process for below 32nm hp
Tsuyoshi Nakamura, Masaru Takeshita, Jiro Yokoya, Yasuhiro Yoshii, Hirokuni Saito, Ryoichi Takasu, Katsumi Ohmori
Proceedings Volume 7639, 76392V (2010) https://doi.org/10.1117/12.846335
KEYWORDS: Lithography, Double patterning technology, Etching, Optical lithography, Photoresist processing, Immersion lithography, Image processing, Photoresist materials, Polymers, Photomasks
Proceedings Article | 1 April 2009 Paper
Topcoat-free ArF negative tone resist
Tomoyuki Ando, Sho Abe, Ryoichi Takasu, Jun Iwashita, Shogo Matsumaru, Ryoji Watanabe, Komei Hirahara, Yujiro Suzuki, Miki Tsukano, Takeshi Iwai
Proceedings Volume 7273, 727308 (2009) https://doi.org/10.1117/12.813787
KEYWORDS: Optical lithography, Lithography, Double patterning technology, Contamination, Scanners, Photomasks, Semiconducting wafers, Immersion lithography, Photoresist processing, Fluorine
Proceedings Article | 1 April 2009 Paper
Newly developed positive tone resists for Posi/Posi double patterning process
Tsuyoshi Nakamura, Masaru Takeshita, Satoshi Maemori, Ryusuke Uchida, Ryoichi Takasu, Katsumi Ohmori
Proceedings Volume 7273, 727304 (2009) https://doi.org/10.1117/12.814028
KEYWORDS: Image processing, Double patterning technology, Etching, Photoresist processing, Coating, Lithography, Immersion lithography, Image resolution, Optical lithography, 193nm lithography
Proceedings Article | 4 December 2008 Paper
Pattern freezing process free litho-litho-etch double patterning
Tomoyuki Ando, Masaru Takeshita, Ryoich Takasu, Yasuhiro Yoshii, Jun Iwashita, Shogo Matsumaru, Sho Abe, Takeshi Iwai
Proceedings Volume 7140, 71402H (2008) https://doi.org/10.1117/12.804710
KEYWORDS: Double patterning technology, Lithography, Optical lithography, Photoresist processing, Photomasks, Semiconducting wafers, Coating, Image processing, Line width roughness, Etching
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