Dr. Simi A. George Profile

Dr. Simi A. George

Senior Center of Excellence Leader at AXA

SPIE Involvement:

Author | Prism Awards Judge

Publications (28)

Proceedings Article | 21 April 2017 Presentation

New laser glass for short pulsed laser applications: the BLG80 (Conference Presentation)

Simi George

Proceedings Volume 10082, 100820X (2017) https://doi.org/10.1117/12.2252799

KEYWORDS: Laser applications, Pulsed laser operation, Ions, Glasses, Laser glasses, Laser systems engineering, Laser development, Solid state lasers, Solid state lighting, Mode locking

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Proceedings Article | 21 April 2017 Presentation

Lasing efficiency of Er-Yb-Cr-glass: A temperature study (Conference Presentation)

Simi George, Joseph Hayden, Mark Davis

Proceedings Volume 10082, 1008208 (2017) https://doi.org/10.1117/12.2252755

KEYWORDS: Defense and security, Retina, Optical fibers, Optical communications, Signal attenuation, Surgery, Erbium, Solid state lasers, Laser applications, Fiber optic communications

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Proceedings Article | 16 March 2016 Paper

High performance ErYb:Glass for eye-safe lasers

Simi George

Proceedings Volume 9726, 97261Q (2016) https://doi.org/10.1117/12.2213110

KEYWORDS: Glasses, Laser spectroscopy, Erbium, Erbium lasers, Lanthanides, Laser glasses, Semiconductor lasers, Optical pumping, Medicine, Solids, Ions, Ytterbium, Absorption, Manufacturing, Chromium

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Proceedings Article | 20 May 2015 Paper

Tougher glasses for eye-safe lasers

Simi George, Paula Vullo

Proceedings Volume 9466, 94660E (2015) https://doi.org/10.1117/12.2176235

KEYWORDS: Glasses, Erbium, Ions, Manufacturing, Laser glasses, Ytterbium, Absorption, Luminescence, Refractive index, Temperature metrology

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Proceedings Article | 28 February 2014 Paper

Spectroscopy of Nd-doped laser materials

Simi George, Joseph Hayden

Proceedings Volume 8959, 89591R (2014) https://doi.org/10.1117/12.2040841

KEYWORDS: Glasses, Absorption, Ions, Laser glasses, Luminescence, Neodymium, Calibration, Sensors, Monochromators, Crystals

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Proceedings Article | 23 March 2012 Paper

50X, 75X mask cleaning effects on EUV lithography process and lifetime: lines and spaces, contacts, and LER

Brittany McClinton, Robert Chen, Simi George, Yongbae Kim, Lorie-Mae Baclea-an, Patrick Naulleau

Proceedings Volume 8322, 83223C (2012) https://doi.org/10.1117/12.918236

KEYWORDS: Photomasks, Line edge roughness, Extreme ultraviolet lithography, Mask cleaning, Reflectivity, Surface roughness, Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet, Lithography

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Proceedings Article | 14 October 2011 Paper

Effect of repetitive acid-based cleaning on EUV mask lifetime and lithographic performance

Robert Chen, Brittany McClinton, Simi George, Yongbae Kim, Lorie-Mae Baclea-an, Patrick Naulleau

Proceedings Volume 8166, 81661O (2011) https://doi.org/10.1117/12.896975

KEYWORDS: Photomasks, Extreme ultraviolet, Surface roughness, Lithography, Reflectivity, Line edge roughness, Critical dimension metrology, Electroluminescence, Atomic force microscopy, Extreme ultraviolet lithography

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Proceedings Article | 16 April 2011 Paper

Critical challenges for EUV resist materials

Patrick Naulleau, Christopher Anderson, Lorie-Mae Baclea-an, Paul Denham, Simi George, Kenneth Goldberg, Gideon Jones, Brittany McClinton, Ryan Miyakawa, Seno Rekawa, Nate Smith

Proceedings Volume 7972, 797202 (2011) https://doi.org/10.1117/12.882955

KEYWORDS: Line edge roughness, Extreme ultraviolet, Chemically amplified resists, Extreme ultraviolet lithography, Photons, Printing, Synchrotrons, Imaging spectroscopy, Stochastic processes, Light sources

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Proceedings Article | 8 April 2011 Paper

22X mask cleaning effects on EUV lithography process and lifetime

Simi George, Robert Chen, Lorie-Mae Baclea-an, Patrick Naulleau

Proceedings Volume 7969, 79691W (2011) https://doi.org/10.1117/12.881525

KEYWORDS: Photomasks, Line edge roughness, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Atomic force microscopy, Scanning electron microscopy, Lithography, Critical dimension metrology, Image processing

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Proceedings Article | 7 April 2011 Paper

Out of band radiation effects on resist patterning

Simi George, Patrick Naulleau

Proceedings Volume 7969, 796914 (2011) https://doi.org/10.1117/12.881161

KEYWORDS: Line edge roughness, Extreme ultraviolet, Optical lithography, Semiconducting wafers, Extreme ultraviolet lithography, Mirrors, Photomasks, Reflectivity, Deep ultraviolet, Light sources

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Proceedings Article | 5 April 2011 Paper

The SEMATECH Berkeley MET: extending EUV learning down to 16nm half pitch

Christopher Anderson, Lorie Mae Baclea-An, Paul Denham, Simi George, Kenneth Goldberg, Michael Jones, Nathan Smith, Thomas Wallow, Warren Montgomery, Patrick Naulleau

Proceedings Volume 7969, 79690R (2011) https://doi.org/10.1117/12.881573

KEYWORDS: Printing, Illumination engineering, Metals, Oxides, Extreme ultraviolet, Chemically amplified resists, Image resolution, Optical lithography, Phase shifts, Modulation

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Proceedings Article | 2 April 2011 Paper

Using synchrotron light to accelerate EUV resist and mask materials learning

Patrick Naulleau, Christopher Anderson, Lorie-Mae Baclea-an, Paul Denham, Simi George, Kenneth Goldberg, Gideon Jones, Brittany McClinton, Ryan Miyakawa, Iacopo Mochi, Warren Montgomery, Seno Rekawa, Tom Wallow

Proceedings Volume 7985, 798509 (2011) https://doi.org/10.1117/12.885420

KEYWORDS: Extreme ultraviolet lithography, Line edge roughness, Extreme ultraviolet, Photomasks, Synchrotrons, Light sources, Printing, Chemically amplified resists, Image resolution, Imaging systems

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Proceedings Article | 29 March 2011 Paper

Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness

Simi George, Patrick Naulleau, Eric Gullikson, Iacopo Mochi, Farhad Salmassi, Kenneth Goldberg, Erik Anderson

Proceedings Volume 7969, 79690E (2011) https://doi.org/10.1117/12.881524

KEYWORDS: Scattering, Speckle, Atomic force microscopy, Multilayers, Extreme ultraviolet, Reflectivity, Photomasks, Scatter measurement, Laser scattering, Surface roughness

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Proceedings Article | 23 March 2010 Paper

The SEMATECH Berkeley MET pushing EUV development beyond 22nm half pitch

Patrick Naulleau, Christopher Anderson, Lorie-Mae Baclea-an, David Chan, Paul Denham, Simi George, Kenneth Goldberg, Brian Hoef, Gideon Jones, Chawon Koh, Bruno La Fontaine, Brittany McClinton, Ryan Miyakawa, Warren Montgomery, Seno Rekawa, Tom Wallow

Proceedings Volume 7636, 76361J (2010) https://doi.org/10.1117/12.848438

KEYWORDS: Line edge roughness, Photomasks, Extreme ultraviolet, Printing, Phase shifts, Lithographic illumination, Extreme ultraviolet lithography, Image resolution, Mask cleaning, Resolution enhancement technologies

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Proceedings Article | 23 March 2010 Paper

Assessing out-of-band flare effects at the wafer level for EUV lithography

Simi George, Patrick Naulleau, Charles Kemp, Paul Denham, Senajith Rekawa

Proceedings Volume 7636, 763626 (2010) https://doi.org/10.1117/12.847953

KEYWORDS: Extreme ultraviolet, Mirrors, Line edge roughness, Extreme ultraviolet lithography, Optical lithography, Photomasks, Semiconducting wafers, Deep ultraviolet, Reflectivity, Ruthenium

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Proceedings Article | 23 March 2010 Paper

Mask roughness and its implications for LER at the 22- and 16nm nodes

Patrick Naulleau, Simi George, Brittany McClinton

Proceedings Volume 7636, 76362H (2010) https://doi.org/10.1117/12.851561

KEYWORDS: Line edge roughness, Photomasks, Line width roughness, Extreme ultraviolet, Speckle, Surface roughness, Ruthenium, Multilayers, Carbon, Reflectivity

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Proceedings Article | 18 March 2010 Paper

Characterization of line-edge roughness (LER) propagation from resists: underlayer interfaces in ultrathin resist films

Simi George, Patrick Naulleau, Ahila Krishnamoorthy, Zeyu Wu, Edward Rutter, Joseph Kennedy, Song Yuan Xie, Kyle Flanigan, Thomas Wallow

Proceedings Volume 7636, 763605 (2010) https://doi.org/10.1117/12.848405

KEYWORDS: Line edge roughness, Interfaces, Thin films, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, 3D image processing, Photoresist processing, Head-mounted displays, Liquids

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SPIE Journal Paper | 1 October 2009

Estimating the out-of-band radiation flare levels for extreme ultraviolet lithography

Simi George, Patrick Naulleau, Senajith Rekawa, Eric Gullikson, Charles Kemp

JM3, Vol. 8, Issue 04, 041502, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238514

KEYWORDS: Mirrors, Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Deep ultraviolet, Plasma, Data modeling, Ultraviolet radiation, Photomasks

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Proceedings Article | 11 May 2009 Paper

Implications of image plane line-edge roughness requirements on extreme ultraviolet mask specifications

Patrick Naulleau, Simi George

Proceedings Volume 7379, 73790O (2009) https://doi.org/10.1117/12.824265

KEYWORDS: Photomasks, Line edge roughness, Line width roughness, Extreme ultraviolet, Speckle, Nanoimprint lithography, 3D modeling, Surface roughness, Semiconducting wafers, Carbon

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Proceedings Article | 18 March 2009 Paper

The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond

Patrick Naulleau, Christopher Anderson, Lorie-Mae Baclea-an, Paul Denham, Simi George, Kenneth Goldberg, Michael Goldstein, Brian Hoef, Russ Hudyma, Gideon Jones, Chawon Koh, Bruno La Fontaine, Brittany McClinton, Ryan Miyakawa, Warren Montgomery, John Roller, Thomas Wallow, Stefan Wurm

Proceedings Volume 7271, 72710W (2009) https://doi.org/10.1117/12.814232

KEYWORDS: Line edge roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Printing, Lithography, Computer aided design, Synchrotrons, Surface roughness

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Proceedings Article | 18 March 2009 Paper

Out-of-band exposure characterization with the SEMATECH Berkeley 0.3-NA microfield exposure tool

Simi George, Patrick Naulleau, Senajith Rekawa, Eric Gullikson, Charles Drew Kemp

Proceedings Volume 7271, 72710X (2009) https://doi.org/10.1117/12.814429

KEYWORDS: Mirrors, Extreme ultraviolet, Reflectivity, Semiconducting wafers, Extreme ultraviolet lithography, Deep ultraviolet, Plasma, Data modeling, Photomasks, Imaging systems

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Proceedings Article | 22 March 2007 Paper

High repetition rate LPP source facility for EUVL

T. Schmid, S. George, J. Cunado, S. Teerawattanasook, R. Bernath, C. Brown, K. Takenoshita, C.-S. Koay, M. Richardson

Proceedings Volume 6517, 65173I (2007) https://doi.org/10.1117/12.713457

KEYWORDS: Extreme ultraviolet, Plasma, Mirrors, Calibration, Reflectivity, Extreme ultraviolet lithography, EUV optics, Metrology, Tin, Diagnostics

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Proceedings Article | 21 March 2007 Paper

Characterization of the tin-doped droplet laser plasma EUVL sources for HVM

Kazutoshi Takenoshita, Simi George, Tobias Schmid, Chiew-Seng Koay, Jose Cunado, Robert Bernath, Christopher Brown, Moza Al-Rabban, William Silfvast, Martin Richardson

Proceedings Volume 6517, 65173O (2007) https://doi.org/10.1117/12.713461

KEYWORDS: Extreme ultraviolet, Plasma, Ions, Mirrors, Tin, Extreme ultraviolet lithography, Diagnostics, Reflectivity, Pulsed laser operation, Gas lasers

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Proceedings Article | 24 March 2006 Paper

EUV generation from lithium laser plasma for lithography

Simi George, William Silfvast, Kazutoshi Takenoshita, Robert Bernath, Chiew-Seng Koay, Greg Shimkaveg, Martin Richardson, Moza Al-Rabban, Howard Scott

Proceedings Volume 6151, 615143 (2006) https://doi.org/10.1117/12.660584

KEYWORDS: Lithium, Plasma, Tin, Extreme ultraviolet, Lithography, Solids, Ions, Sensors, EUV optics, Light sources

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Proceedings Article | 6 May 2005 Paper

High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL

Chiew-Seng Koay, Simi George, Kazutoshi Takenoshita, Robert Bernath, Etsuo Fujiwara, Martin Richardson, Vivek Bakshi

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.596753

KEYWORDS: Tin, Plasma, Extreme ultraviolet, Pulsed laser operation, Calibration, Extreme ultraviolet lithography, Ions, Laser energy, Spectroscopy, Xenon

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Proceedings Article | 6 May 2005 Paper

EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas

Simi George, Chiew-Seng Koay, Kazutoshi Takenoshita, Robert Bernath, Moza Al-Rabban, Christian Keyser, Vivek Bakshi, Howard Scott, Martin Richardson

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.596781

KEYWORDS: Tin, Plasma, Extreme ultraviolet, Spectroscopy, Ions, Spectrometers, Solids, Pulsed laser operation, Extreme ultraviolet lithography, Lithium

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Proceedings Article | 6 May 2005 Paper

Radiation transport modeling for Xe and Sn-doped droplet laser-plasma sources

Moza Al-Rabban, Christian Keyser, Simi George, Howard Scott, Vivek Bakshi, Martin Richardson

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.596767

KEYWORDS: Plasma, Tin, Ions, Xenon, Extreme ultraviolet, Pulsed laser operation, Extreme ultraviolet lithography, Data modeling, Optical simulations, Spherical lenses

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Proceedings Article | 17 March 2005 Paper

Diagnostics for laser plasma EUV sources

Martin Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, C. Keyser, Robert Bernath, Simi George, Somsak Teerawattanasook

Proceedings Volume 5580, (2005) https://doi.org/10.1117/12.597349

KEYWORDS: Plasma, Extreme ultraviolet, Mirrors, Crystals, Diagnostics, Extreme ultraviolet lithography, Imaging systems, Imaging spectroscopy, Sensors, Zirconium

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Showing 5 of 28 publications

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