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Toru Nomura
at Ushio Inc
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 10 April 2024 Presentation
Interference lithography system consisting high precision pitch control and automatically beam alignment modules
Yohei Nawaki, Kohei Toyoda, Shunta Sugisaki, Shinji Orihara, Toru Nomura, Kentaro Nomoto, Kazuyuki Tsuruoka
Proceedings Volume PC12956, PC129560J (2024) https://doi.org/10.1117/12.3010198
KEYWORDS: Lithography, Automatic alignment, Control systems, Beam controllers, Automatic control, Semiconducting wafers, Optical lithography, Optical alignment, Metrology, Waveguides
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