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Tzu-Yi Wang
at Taiwan Semiconductor Manufacturing Co Ltd
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Publications (1)
Proceedings Article | 28 October 2015 Paper
Quantitative analysis of CD degradation induced by the fogging effect in e-beam lithography
Shao-Wen Chang, Tzu-Yi Wang, Ta-Cheng Lien, Chia-Jen Chen, Chih-Cheng Lin, Sin-Chang Lee, Anthony Yen
Proceedings Volume 9635, 96350I (2015) https://doi.org/10.1117/12.2197838
KEYWORDS: Photomasks, Critical dimension metrology, Electron beam lithography, Forward error correction, Modulation, Quantitative analysis, Etching, Mask making, Electron beams, Objectives
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