Prof. Vasily I. Shevyakov Profile

Prof. Vasily I. Shevyakov

at National Research Univ of Electronic Technology

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 31 January 2022 Paper

Paper

Investigation of the electrophysical and mechanical properties of metallization based on alloys W with Re, Ti, N for high-temperature silicon VLSI

A. Timakov, V. Shevyakov

Proceedings Volume 12157, 1215719 (2022) https://doi.org/10.1117/12.2624348

KEYWORDS: Tungsten, Silicon, Silicon films, Rhenium, Resistance, Titanium, Nitrogen, Oxides, Very large scale integration, Copper

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Proceedings Article | 31 January 2022 Paper

Paper

Investigation of the deposition features and characteristics of diffusion-barrier layers of Ti-TiN for metallization in MIS-transistor structures with a vertical channel

V. Gornostay-Polsky, V. Shevyakov

Proceedings Volume 12157, 121571A (2022) https://doi.org/10.1117/12.2624508

KEYWORDS: Titanium, Tin, Silicon, Plasma, Coating, Plasma treatment, Metals, Metalorganic chemical vapor deposition, Diffusion

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Proceedings Article | 15 March 2019 Paper

Paper

Formation features and electrophysical properties of ferroelectric films ZnO study

A. Zotov, A. Perevalov, V. Shevyakov, A. Belov

Proceedings Volume 11022, 110221D (2019) https://doi.org/10.1117/12.2521973

KEYWORDS: Zinc oxide, Sputter deposition, Oxygen, Heat treatments, Resistance, Argon, Annealing, Atomic layer deposition, Zinc, Thin films

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Proceedings Article | 15 March 2019 Paper

Paper

Features of silicon deep plasma etching process at 3D-TSV structures producing

A. Golishnikov, D. Kostyukov, M. Putrya, V. Shevyakov

Proceedings Volume 11022, 110221Z (2019) https://doi.org/10.1117/12.2521969

KEYWORDS: Silicon, Etching, Plasma etching, Plasma, Particles, Ions, Polymerization, Photoresist materials, Semiconducting wafers, Silicon films

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Proceedings Article | 30 December 2016 Paper

Paper

Tungsten alloyed with rhenium as an advanced material for heat-resistant silicon ICs interconnects

A. Belov, Yu. Chaplygin, A. Golishnikov, D. Kostyukov, M. Putrya, S. Safonov, V. Shevyakov

Proceedings Volume 10224, 1022404 (2016) https://doi.org/10.1117/12.2264789

KEYWORDS: Rhenium, Tungsten, Silicon, Resistance, Silicon films, Semiconducting wafers, Sensors, Control systems, Manufacturing, Copper

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Proceedings Article | 30 December 2016 Paper

Paper

Features of local anodic oxidation process

A. Belov, Yu. Chaplygin, S. Lemeshko, I. Sagunova, V. Shevyakov

Proceedings Volume 10224, 102241Q (2016) https://doi.org/10.1117/12.2264436

KEYWORDS: Oxidation, Photomasks, Oxides, Dielectrics, Conductive coatings, Modulation, Resistance, Silicon, Solid state electronics, Nanolithography

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Proceedings Article | 18 December 2014 Paper

Paper

Nanostructured chalcogenide materials for memory switching devices

O. Pyatilova, S. Gavrilov, R. Rozanov, A. Zheleznyakova, A. Belov, V. Shevyakov

Proceedings Volume 9440, 944007 (2014) https://doi.org/10.1117/12.2179474

KEYWORDS: Thin films, Bismuth, Switching, Metals, Thin film deposition, Ions, Chalcogenides, Copper, Scanning electron microscopy, Atomic force microscopy

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Proceedings Article | 18 December 2014 Paper

Paper

Modification of cantilevers for atomic-force microscopy using the method of exposure defocused ion beam

S. Antonov, S. Yu. Krasnoborodko, S. Smagulova, Y. Chaplygin, V. Shevyakov

Proceedings Volume 9440, 94400O (2014) https://doi.org/10.1117/12.2179243

KEYWORDS: Ions, Ion beams, Atomic force microscopy, Silicon, Scanning electron microscopy, Etching, Aluminum, Image processing, Deconvolution, Spherical lenses

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Proceedings Article | 18 December 2014 Paper

Paper

Aluminum anodization process modeling approach

Alexey Belov, Maksim Vorobiev, Sergey Gavrilov, Vasiliy Shevyakov

Proceedings Volume 9440, 94400Z (2014) https://doi.org/10.1117/12.2179218

KEYWORDS: Aluminum, Oxides, Interfaces, Ions, 3D modeling, Numerical simulations, Polishing, Oxygen, Metals, Oxidation

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Proceedings Article | 10 June 2006 Paper

Paper

Factors effected on nanoporous anodic alumina ordering

S. Gavrilov, A. Zheleznyakova, A. Belov, D. Yu. Barabanov, V. Shevyakov, E. Vishnikin, A. Khlynov

Proceedings Volume 6260, 626011 (2006) https://doi.org/10.1117/12.683296

KEYWORDS: Oxides, Interfaces, Metals, Semiconductors, Diffusion, Temperature metrology, Control systems, Microcontrollers, Nanotechnology, Oxidation

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Showing 5 of 10 publications

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