Cathy Wang
at ASML Taiwan Ltd
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 22 February 2021 Presentation + Paper
Kaustuve Bhattacharyya, Ken Chang, Jeff Lin, Simon Mathijssen, Marc Noot, Farzad Farhadzadeh, Arie Den Boef, Momo Lin, Frank Sun, Justin Huang, Sax Liao, Edison Wang, Jason Hung, Benny Gosali, Wilson Liu, Cathy Wang, Matthew Mclaren
Proceedings Volume 11611, 116110C (2021) https://doi.org/10.1117/12.2583861
KEYWORDS: Overlay metrology, Metrology, Etching, Data modeling, Model-based design, Measurement devices, Lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Simon Mathijssen, Marc Noot, Murat Bozkurt, Narjes Javaheri, Reza Hajiahmadi, Antonios Zagaris, Ken Chang, Benny Gosali, Eason Su, Cathy Wang, Arie den Boef, Kaustuve Bhattacharyya, Guo-Tsai Huang, Kai-Hsiung Chen, John Lin
Proceedings Volume 10959, 109591G (2019) https://doi.org/10.1117/12.2514949
KEYWORDS: Overlay metrology, Semiconducting wafers, Diffraction gratings, Scanning electron microscopy, Diffraction, Etching, Target detection, Sensors, Metrology, Switching

Proceedings Article | 20 March 2018 Presentation + Paper
Theo Thijssen, Marcel Beckers, Albert Mollema, Leon Levasier, Alexander Padi, Chia-Wei Hung, Hsiao-Lan Chen, Laurens van Bokhoven, Niels Lammers, Jean Phillippe van Damme, Floris Teeuwisse, Robin Tijssen, Wilson Tzeng, Cathy Wang, Marcel Mastenbroek, Harald Vos, Ting-Ju Yueh, Miao-Chi Chen , Hsueh-Hung Wu, Shin-Rung Peng, Chun-Kuang Chen, L. J. Chen , Kevin Cheng, John Lin
Proceedings Volume 10587, 1058709 (2018) https://doi.org/10.1117/12.2297387
KEYWORDS: Pellicles, Reticles, Deep ultraviolet, Overlay metrology, Extreme ultraviolet, Scanners, Distortion, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers

Proceedings Article | 13 March 2018 Presentation + Paper
Kaustuve Bhattacharyya, Marc Noot, Hammer Chang, Sax Liao, Ken Chang, Benny Gosali, Eason Su, Cathy Wang, Arie den Boef, Christophe Fouquet, Guo-Tsai Huang, Kai-Hsiung Chen, Kevin Cheng, John Lin
Proceedings Volume 10585, 105851F (2018) https://doi.org/10.1117/12.2297420
KEYWORDS: Overlay metrology, Semiconducting wafers, Etching, Polarization, Metrology, Scanning electron microscopy, Physics, Signal processing, Monte Carlo methods, Semiconductor manufacturing

Proceedings Article | 28 March 2017 Presentation + Paper
Kaustuve Bhattacharyya, Arie den Boef, Marc Noot, Omer Adam, Grzegorz Grzela, Andreas Fuchs, Martin Jak, Sax Liao, Ken Chang, Vincent Couraudon, Eason Su, Wilson Tzeng, Cathy Wang, Christophe Fouquet, Guo-Tsai Huang, Kai-Hsiung Chen, Y. C. Wang, Kevin Cheng, Chih-Ming Ke, L. G. Terng
Proceedings Volume 10145, 101450A (2017) https://doi.org/10.1117/12.2257662
KEYWORDS: Overlay metrology, Polarization, Semiconducting wafers, Defense systems, Process control, Wafer-level optics, Diffraction gratings, Solids, Metrology, Image quality, Target detection, Detection and tracking algorithms, Diffraction, Thin films

Showing 5 of 15 publications
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