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Yoshiyuki Kikuchi
at Tokyo Electron Limited
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Publications (1)
Proceedings Article | 28 March 2014 Paper
Large-radius neutral beam enhanced chemical vapor deposition process for non-porous ultra-low-k SiOCH
Yoshiyuki Kikuchi, Yasuaki Sakakibara, Seiji Samukawa
Proceedings Volume 9054, 90540H (2014) https://doi.org/10.1117/12.2048898
KEYWORDS: Copper, Silicon, Plasma, Plasma enhanced chemical vapor deposition, Annealing, Diffusion, Silicon films, Chemical species, Chemical vapor deposition, Oxygen
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