Development of a Nanometric E-Beam Lithography System (JBX-5DII)

M.Hassel Shearer; H. Takemura; M. Isobe; N. Goto; K. Tanaka; S. Miyauchi

doi:10.1117/12.947479

20 June 1985 Development of a Nanometric E-Beam Lithography System (JBX-5DII)

M.Hassel Shearer, H. Takemura, M. Isobe, N. Goto, K. Tanaka, S. Miyauchi

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947479
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

The production of VHSIC and microwave devices has shown that submicron lithography by E-beam, Optical, or X-ray systems is rapidly becoming feasible. There is, however, a developing demand for a nanolithography tool for producing Josephson, GaAs, optoelectronic devices and for investigating the physics of scaling of semiconductor devices.

Citation Download Citation

M.Hassel Shearer, H. Takemura, M. Isobe, N. Goto, K. Tanaka, and S. Miyauchi "Development of a Nanometric E-Beam Lithography System (JBX-5DII)", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947479

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