Metal Reflectors in the EUV

Marion L. Scott; Paul N. Arendt; Bernard Cameron; Richard Cordi; Brian Newnam; David Windt; Webster Cash

doi:10.1117/12.936616

12 August 1986 Metal Reflectors in the EUV

Marion L. Scott, Paul N. Arendt, Bernard Cameron, Richard Cordi, Brian Newnam, David Windt, Webster Cash

Proceedings Volume 0691, X-Ray Imaging II; (1986) https://doi.org/10.1117/12.936616
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

High reflectance mirrors are difficult to achieve in the extreme ultraviolet (EUV) and we have found that one of the principle reasons is the presence of contamination layers on the surface of these reflectors.¹ We have begune7study of these contamination layers that form even in an ultra-high vacuum (UHV) system. ' Our initial study consists of monitoring the growth of these contamination layers on various metal surfaces utilizing Auger electron spectroscopy (AES). A principal conclusion from this work is that the rate of growth of oxide and carbon contamination layers on Al, Si, and Rh is greatly enhanced if the ion gauges and Auger filaments are operating. Reflectance measurements on Rh at 11.3 nm also indicate the presence of significant carbon contamination on samples exposed to air. In addition, we find that oxide growth on Ag is negligible and carbon contamination is minimal.

Citation Download Citation

Marion L. Scott, Paul N. Arendt, Bernard Cameron, Richard Cordi, Brian Newnam, David Windt, and Webster Cash "Metal Reflectors in the EUV", Proc. SPIE 0691, X-Ray Imaging II, (12 August 1986); https://doi.org/10.1117/12.936616

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