Nanoimprint, DSA, and multi-beam lithography: patterning technologies with new integration challenges

S. Landis; H. Teyssedre; G. Claveau; I. Servin; F. Delachat; M. L. Pourteau; A. Gharbi; P. Pimenta Barros; R. Tiron; L. Nouri; N. Possemé; M. May; P. Brianceau; S. Barnola; Y. Blancquaert; J. Pradelles; P. Essomba; A. Bernadac; B. Dal'zotto; S. Bos; M. Argoud; G. Chamiot-Maitral; A. Sarrazin; C. Tallaron; C. Lapeyre; L. Pain

doi:10.1117/12.2259966

10 April 2017 Nanoimprint, DSA, and multi-beam lithography: patterning technologies with new integration challenges

S. Landis, H. Teyssedre, G. Claveau, I. Servin, F. Delachat, M. L. Pourteau, A. Gharbi, P. Pimenta Barros, R. Tiron, L. Nouri, N. Possemé, M. May, P. Brianceau, S. Barnola, Y. Blancquaert, J. Pradelles, P. Essomba, A. Bernadac, B. Dal'zotto, S. Bos, M. Argoud, G. Chamiot-Maitral, A. Sarrazin, C. Tallaron, C. Lapeyre, L. Pain

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Proceedings Volume 10149, Advanced Etch Technology for Nanopatterning VI; 101490K (2017) https://doi.org/10.1117/12.2259966
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

In the lithography landscape, EUV technology recovered some credibility recently. However, its large adoption remains uncertain. Meanwhile, 193nm immersion lithography, with multiple-patterning strategies, supports the industry preference for advanced-node developments. In this landscape, lithography alternatives maintain promise for continued R&D. Massively parallel electron-beam and nano-imprint lithography techniques remain highly attractive, as they can provide noteworthy cost-of-ownership benefits. Directed self-assembly lithography shows promising resolution capabilities and appears to be an option to reduce multi-patterning strategies. Even if large amount of efforts are dedicated to overcome the lithography side issues, these solutions introduce also new challenges and opportunities for the integration schemes.

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S. Landis, H. Teyssedre, G. Claveau, I. Servin, F. Delachat, M. L. Pourteau, A. Gharbi, P. Pimenta Barros, R. Tiron, L. Nouri, N. Possemé, M. May, P. Brianceau, S. Barnola, Y. Blancquaert, J. Pradelles, P. Essomba, A. Bernadac, B. Dal'zotto, S. Bos, M. Argoud, G. Chamiot-Maitral, A. Sarrazin, C. Tallaron, C. Lapeyre, and L. Pain "Nanoimprint, DSA, and multi-beam lithography: patterning technologies with new integration challenges", Proc. SPIE 10149, Advanced Etch Technology for Nanopatterning VI, 101490K (10 April 2017); https://doi.org/10.1117/12.2259966

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