Holographic Generation Of Gratings With Periodicities Below 150 nm With An Excimer Laser

T. Ahlhorn; H. Pohlmann; J. P. Kotthaus

doi:10.1117/12.950154

26 April 1989 Holographic Generation Of Gratings With Periodicities Below 150 nm With An Excimer Laser

T. Ahlhorn, H. Pohlmann, J. P. Kotthaus

Proceedings Volume 1023, Excimer Lasers and Applications; (1989) https://doi.org/10.1117/12.950154
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

Holographic generation of gratings with periodicities down to 140nm in thin polymethyl methacrylate (PMMA) layers on Si-substrates using a narrow band KrF-excimer laser (λ=248 nm) is reported. At low single pulse energy densities (<3OmJ/cm2) the gratings are prepared by conventional photolithography. At higher single pulse energy densities (>70mJ/cm2) we directly write gratings in the PMMA by photoetching (ablation).

Citation Download Citation

T. Ahlhorn, H. Pohlmann, and J. P. Kotthaus "Holographic Generation Of Gratings With Periodicities Below 150 nm With An Excimer Laser", Proc. SPIE 1023, Excimer Lasers and Applications, (26 April 1989); https://doi.org/10.1117/12.950154

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available