Methods for monolithically fabricating photonic integrated circuits

Emil S. Koteles

doi:10.1117/12.192183

3 November 1994 Methods for monolithically fabricating photonic integrated circuits

Emil S. Koteles

Proceedings Volume 10278, Defining the Global Information Infrastructure: Infrastructure, Systems, and Services: A Critical Review; 102780C (1994) https://doi.org/10.1117/12.192183
Event: Photonics for Industrial Applications, 1994, Boston, MA, United States

Abstract

The development of a practical technique for monolithically integrating optoelectronic components on a semiconductor chip is necessary in order to unleash the full capacity of the optical fiber based information superhighway. This paper establishes the criteria for photonic integration, reviews the progress achieved by several techniques presently being actively studied (in particular, selective area regrowth, selective area growth, and selective area quantum well intermixing), and critiques their near and long term futures. Since practicality implies low cost which, in turn, implies simplicity in growth and processing, initial photonic integrated circuits (PIC) will likely involve a tradeoff between manufacturability and performance. Thus, elementary PICs fabricated using the simplest technologies will emerge in the marketplace first. In the longer term, as growth and processing are brought under better control, more sophisticated PICs using complex integration technologies will also become available.

Citation Download Citation

Emil S. Koteles "Methods for monolithically fabricating photonic integrated circuits", Proc. SPIE 10278, Defining the Global Information Infrastructure: Infrastructure, Systems, and Services: A Critical Review, 102780C (3 November 1994); https://doi.org/10.1117/12.192183

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