Paper
18 May 1989 Modification Of Surfaces Under The Action Of UV Laser Radiation
V. P. Ageev, V. I . Konov, A. V. Kuzmichev
Author Affiliations +
Proceedings Volume 1033, Trends in Quantum Electronics; (1989) https://doi.org/10.1117/12.950618
Event: International Conference on Trends in Quantum Electronics, 1988, Bucharest, Romania
Abstract
New results on excimer laser application for fine surface structurization are presented. There are considered peculiarities of the UV-photon induced processes of:(i) chemical deposition of carbon and silicon carbide films from CC14 and CH3SiC13vapour precursors onto dielectric substrates,(ii) chemical etching of c-Si in CC14 vapour environment, and (iii) microstructures production by decomposition of organo-metallic (metal resinate) films. The fundamental role of superposition of thermal and photo-stimulated processes is also discussed.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
V. P. Ageev, V. I . Konov, and A. V. Kuzmichev "Modification Of Surfaces Under The Action Of UV Laser Radiation", Proc. SPIE 1033, Trends in Quantum Electronics, (18 May 1989); https://doi.org/10.1117/12.950618
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KEYWORDS
Etching

Silicon

Molecules

Ultraviolet radiation

Silicon carbide

Absorption

Quantum electronics

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