Slit manufacturing and integration for the Sentinel-4 NIR and UV-VIS spectrometers

Matthias Mohaupt; Uwe Zeitner; Gerd Harnisch

doi:10.1117/12.2296065

25 September 2017 Slit manufacturing and integration for the Sentinel-4 NIR and UV-VIS spectrometers

Matthias Mohaupt, Uwe Zeitner, Gerd Harnisch

Author Affiliations +

Proceedings Volume 10562, International Conference on Space Optics — ICSO 2016; 105624M (2017) https://doi.org/10.1117/12.2296065
Event: International Conference on Space Optics — ICSO 2016, 2016, Biarritz, France

Abstract

The sentinel–4 spectrometer´s slits are the key components of the ultraviolet–visible (UV–VIS) and the near infrared (NIR) channels for earth observation, with absolute slit width accuracy and variation required as < 0.1 ?m, respectively, and slit planarity < 0.4 ?m peak to valley (P-V). Adapted lithographic structuring techniques as developed for the dry- and wet etching of silicon-on-insulator (SOI) wafers combined with special integration devices for accurate alignment as well as precision optical polishing of the mounting planes of the slit holders together with spring elements can fulfil these requirements. Protected aluminum coating ensures a light tight optical density at wavelengths between 200 nm and 1200 nm, electrical grounding, and chemical protection.

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Matthias Mohaupt, Uwe Zeitner, and Gerd Harnisch "Slit manufacturing and integration for the Sentinel-4 NIR and UV-VIS spectrometers", Proc. SPIE 10562, International Conference on Space Optics — ICSO 2016, 105624M (25 September 2017); https://doi.org/10.1117/12.2296065

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KEYWORDS

Near infrared

Etching

Coating

Interfaces

Manufacturing

Astronomical imaging

Silicon

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