The partial coherence modulation transfer function in testing lithography lens

Jiun-Woei Huang

doi:10.1117/12.2297165

20 March 2018 The partial coherence modulation transfer function in testing lithography lens

Jiun-Woei Huang

Proceedings Volume 10587, Optical Microlithography XXXI; 105871D (2018) https://doi.org/10.1117/12.2297165
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Due to the lithography demanding high performance in projection of semiconductor mask to wafer, the lens has to be almost free in spherical and coma aberration, thus, in situ optical testing for diagnosis of lens performance has to be established to verify the performance and to provide the suggesting for further improvement of the lens, before the lens has been build and integrated with light source. The measurement of modulation transfer function of critical dimension (CD) is main performance parameter to evaluate the line width of semiconductor platform fabricating ability for the smallest line width of producing tiny integrated circuits. Although the modulation transfer function (MTF) has been popularly used to evaluation the optical system, but in lithography, the contrast of each line-pair is in one dimension or two dimensions, analytically, while the lens stand along in the test bench integrated with the light source coherent or near coherent for the small dimension near the optical diffraction limit, the MTF is not only contributed by the lens, also by illumination of platform. In the study, the partial coherence modulation transfer function (PCMTF) for testing a lithography lens is suggested by measuring MTF in the high spatial frequency of in situ lithography lens, blended with the illumination of partial and in coherent light source. PCMTF can be one of measurement to evaluate the imperfect lens of lithography lens for further improvement in lens performance.

Citation Download Citation

Jiun-Woei Huang "The partial coherence modulation transfer function in testing lithography lens", Proc. SPIE 10587, Optical Microlithography XXXI, 105871D (20 March 2018); https://doi.org/10.1117/12.2297165

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