Paper
6 July 2018 Evaluation of x-ray reflectors by optical diffraction patterns
Author Affiliations +
Abstract
Performance of X-ray reflectors affects that of X-ray mirrors. Modern X-ray mirrors have thousands of reflectors to gain large effective area. Evaluation of the reflectors is an important process in production of the mirrors. A diffraction pattern dominates reflector image when the parallel optical beam illuminates the reflector along its optical axis because the reflectors are used at grazing incident angles of around 1 deg and their effective width are 1–10 mm. A diffraction pattern from the entire reflector surface can be acquired at once with the aid of a lens. The diffraction pattern holds information of the surface profiles of the reflectors. To quantitatively evaluate the reflectors with the diffraction pattern, we created a diffraction pattern model by the wave optics with the ideal surface profile and fitted it to data. As a result, a correlation between fitting residual and the normal vector distribution of the surface profile was found. With our method, the reflectors can be evaluated and sorted out more efficiently.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takayuki Hayashi, Takashi Okajima, and Yang Soong "Evaluation of x-ray reflectors by optical diffraction patterns", Proc. SPIE 10699, Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray, 106993X (6 July 2018); https://doi.org/10.1117/12.2310018
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KEYWORDS
Reflectors

Diffraction

X-rays

Mirrors

X-ray optics

Data modeling

X-ray diffraction

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