An excellent performance optical system for freeform pupil illumination module in immersion photolithography machine

Zongshun Zeng; Zhiyuan Niu; Fang Zhang; Xiaozhe Ma; Siyu Zhu; Weijie Shi; Aijun Zeng; Huijie Huang

doi:10.1117/12.2501208

24 July 2018 An excellent performance optical system for freeform pupil illumination module in immersion photolithography machine

Zongshun Zeng, Zhiyuan Niu, Fang Zhang, Xiaozhe Ma, Siyu Zhu, Weijie Shi, Aijun Zeng, Huijie Huang

Author Affiliations +

Proceedings Volume 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018); 1082732 (2018) https://doi.org/10.1117/12.2501208
Event: Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018), 2018, Shanghai, China

Abstract

With the application of source mask optimization (SMO) technology in the 28nm and below nodes photolithography machine, the freeform pupil illumination technology has been widely utilized to achieve resolution enhancement for various complex patterns. The freeform illumination module (FIM) equipped with micro-mirror array (MMA) are proposed, which could realize arbitrary pupil by adjusting the angle position distribution of MMA. Therefore, it is necessary to research the freeform pupil illumination technology in immersion photolithography machine. An excellent performance optical system for FIM mainly including homogenization unit, micro-lens array (MLA), MMA and Fourier transform lens is proposed in this paper. The homogenization unit is used to increase the uniformity of the beam incident onto MMA. The beam incident onto MLA is divided and focused on MMA. The focused sub-beams are reflected by micro-mirrors and then incident into Fourier transform lens. And the freeform pupil is generated at its back focal plane. In order to verify the feasibility of the designed optical system, three freeform pupils optimized by SMO are input into the designed FIM and the corresponding simulated pupils are exported. Furthermore, the photolithography performance simulations of the optimized and simulated pupils are implemented in optical model. The results indicate that their critical dimension (CD) differences are less than 0.5nm RMS for thousands of patterns in 40nm-80nm, such as line end, line space, contact hole, end to line, SRAM et. al., which shows that the excellent performance of the designed FIM.

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Zongshun Zeng, Zhiyuan Niu, Fang Zhang, Xiaozhe Ma, Siyu Zhu, Weijie Shi, Aijun Zeng, and Huijie Huang "An excellent performance optical system for freeform pupil illumination module in immersion photolithography machine", Proc. SPIE 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018), 1082732 (24 July 2018); https://doi.org/10.1117/12.2501208

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KEYWORDS

Optical lithography

Optical design

Fourier transforms

Device simulation

Homogenization

Micromirrors

Resolution enhancement technologies

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