Linear/Angular Displacement Interferometer For Wafer Stage Metrology

Gary E. Sommargren

doi:10.1117/12.953154

25 July 1989 Linear/Angular Displacement Interferometer For Wafer Stage Metrology

Gary E. Sommargren

Author Affiliations +

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953154
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

A dual measurement interferometer has been developed specifically for wafer stage metrology. The interferometer concurrently measures both linear and angular displacement. It is designed to conserve space, minimize stage mass, eliminate heat sources and provide high resolution and slew rate.

Citation Download Citation

Gary E. Sommargren "Linear/Angular Displacement Interferometer For Wafer Stage Metrology", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953154

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