E-Beam Application Of Highly Sensitive Positive And Negative-Tone Resists For X-Ray Mask Making

Siegfried Pongratz; Rita Demmeler; Christian Ehrlich; Klaus Kohlmann; Klaus Reimer; Ralph Dammel; Wolfgang Hessemer; Jurgen Lingnau; Ude Scheunemann; Jurgen Theis

doi:10.1117/12.968538

1 August 1989 E-Beam Application Of Highly Sensitive Positive And Negative-Tone Resists For X-Ray Mask Making

Siegfried Pongratz, Rita Demmeler, Christian Ehrlich, Klaus Kohlmann, Klaus Reimer, Ralph Dammel, Wolfgang Hessemer, Jurgen Lingnau, Ude Scheunemann, Jurgen Theis

Author Affiliations +

Proceedings Volume 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII; (1989) https://doi.org/10.1117/12.968538
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

Resist sensitivity is one of the limiting factors in X-ray as well as e-beam lithography. To overcome the rather low sensitivities of commonly used resists like PMMA, a positive-tone X-ray resist ("RAY-PF") has been recently developed, which makes use of the concept of "chemical amplification". Since a novolak is included as a binder matrix, development can be performed by aqueous alkaline solutions, e.g. ^RAZ-Developer. Replacement of the dissolution inhibitor in RAY-PF by a chemical crosslinker yields a negative-tone resist ("RAY-PN") with very similar processing. The present investigation refers to the application of both resist types, originally designed to meet the demands of X-ray lithography, to high resolution e-beam lithography as applied for X-ray mask fabrication.

Citation Download Citation

Siegfried Pongratz, Rita Demmeler, Christian Ehrlich, Klaus Kohlmann, Klaus Reimer, Ralph Dammel, Wolfgang Hessemer, Jurgen Lingnau, Ude Scheunemann, and Jurgen Theis "E-Beam Application Of Highly Sensitive Positive And Negative-Tone Resists For X-Ray Mask Making", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); https://doi.org/10.1117/12.968538

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available