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The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org. The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from these proceedings: Author(s), “Title of Paper,” in Laser-based Micro- and Nanoprocessing XIII, edited by Udo Klotzbach, Akira Watanabe, Rainer Kling, Proceedings of SPIE Vol. 10906 (SPIE, Bellingham, WA, 2019) Seven-digit Article CID Number. ISSN: 0277-786X ISSN: 1996-756X (electronic) ISBN: 9781510624542 ISBN: 9781510624559 (electronic) Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time)· Fax +1 360 647 1445 Copyright © 2019, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/19/$18.00. Printed in the United States of America by Curran Associates, Inc., under license from SPIE Publication of record for individual papers is online in the SPIE Digital Library.
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AuthorsNumbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. Aguilar-Morales, A., 0S Alamri, S., 0S Alexander, Dennis R., 0N, 0Q Ancona, Antonio, 0E, 0O Anderson, Mark, 0N, 0Q Aoyagi, Eiji, 12 Arakawa, Masaki, 09 Atkins, Robert, 0A Badiee, Amir, 07 Bae, Jongsuck, 1L Basso, E. T., 1I Bessho, Motoki, 1L Bhaskar, Arun, 0K Bieda, M., 0S Bolsinger, Marius, 1D Bourdenet, R., 1P Braud, Flavie, 0K Buencuerpo, J., 1H Butkus, Simas, 0H Cai, Jinguang, 12 Casquero, N., 1H Chai, Yingjie, 1R Champion, A., 0F Cheng, He, 1R Chicanne, C., 1P Cinquino, Marco, 0O Costa, Carolina, 11 Décultot, M., 0F Di Franco, Cinzia, 0O Di Mundo, Rosa, 0O Dogan, Y., 0A Du, Xinpeng, 1R Dubois, Emmanuel, 0K Ediger, Aaron, 0Q Ehrenmann, Steffen, 04 Ehrhardt, M., 0T Enderle, Sebastian, 1D Faber, Max, 1G Faucon, M., 1B Flamm, Daniel, 16, 1G Fuchs, U., 14 Fujimoto, Junichi, 09 Gaquiere, Christophe, 0K Gaudiuso, Caterina, 0O Gebauer, Jana, 0C Geoffray, I., 1P Ghosh, Priyanka, 07 Giannuzzi, Giuseppe, 0O Gloria, Daniel, 0K Gogos, George, 0Q Goto, Tetsuya, 0J Götze, Marco, 11 Gräf, S., 14 Grossmann, Daniel, 16, 1G Hamam, H., 1I Heilmann, Andreas, 11 Heimes, Andreas, 0G Henrottin, A., 0F Hillrichs, Georg, 11 Horita, Naoki, 1L Hu, C., 0A Hu, Juejun, 0X Huneus, Florian, 0G Ikenoue, Hiroshi, 0J Imokawa, Kaname, 0J Ito, Shun, 12 Janami, Kian, 0G Jebali, M. A., 1I Jenne, Michael, 16, 1G Kaiser, M., 16 Kang, Myungkoo, 0X Kar, Aravinda, 1R Kawasuji, Yasufumi, 09 Kiedrowski, Thomas, 15 Kleiner, Jonas, 16, 1G Kling, R., 1B Klotzbach, Udo, 0C, 0S Knoblauch, Volker, 1D Kobayashi, Masakazu, 09 Kracht, C., 0S Krupop, B., 0S Kruse, Corey, 0Q Kumkar, Malte, 16, 1G Kunze, T., 0S Kürbitz, Tobias, 11 Lang, V., 0S Lasagni, Andrés Fabían, 0C, 0S, 0W, 15 Le Goaec, B., 1B Lingel, Christian, 0G Lorenz, P., 0T Lugarà, Pietro Mario, 0O Madsen, C. K., 0A Malendevych, Teodor, 0X Martínez-Calderón, M., 1H Merle, M., 1P Mezera, M., 0U Mikhaylov, Dmitriy, 15 Mincuzzi, G., 1B Mingareev, Ilya, 0X Mirenghi, Luciana, 0O Mizoguchi, Hakaru, 09 Mizutani, Akira, 09 Möhl, A., 14 Morrison, M., 0A Müller, F. A., 14 Nagayama, Norio, 1N Nakamura, Daisuke, 0J Neugebauer, Christoph, 04 Nishio, Takuei, 1N Nolte, Stefan, 16, 1G Nourry, S., 1B Ogawa, Sayaka, 12 Okada, Etienne, 0K Olaizola, S. M., 1H Ono, Shingo, 1L Onose, Takashi, 09 Osellame, Roberto, 0E Pacella, Manuela, 07 Pagano, P., 1B Paiè, Petra, 0E Paipulas, Domas, 0H Patars, J., 0F Peng, Edwin, 0N, 0Q Pérez, N., 1H Philippe, Justine, 0K Quaranta, Salay, 04 Rahaman, Arifur, 1R Ramos-de-Campos, J. A., 0F Rank, A., 0W Rebière, A., 1B Rest, Christian, 04 Richardson, Kathleen, 0X Richardson, Martin, 0X Riegel, Harald, 1D Robillard, Jean-François, 0K Rodríguez, A., 1H Römer, G.R.B.E., 0U Roth, Nick, 0Q Ruck, Simon, 1D Sadoh, Taizoh, 0J Sadowitz, Jon, 04 San-Blas, A., 1H Sánchez-Brea, L., 1H Scamarcio, Gaetano, 0O Schell, F., 0S Schmelzer, Christian E. H., 11 Shield, Jeffrey, 0N, 0Q Shimbori, Masashi, 09 Sirutkaitis, Valdas, 0H Soileau, M.J., 1R Steege, T., 0S Storm, S., 0S Sudo, Masaaki, 1L Suhara, Hiroyuki, 1N Suwa, Akira, 09, 0J Tamura, Asato, 1N Tanaka, Nozomu, 0J Tao, Sha, 1A Teutoburg-Weiss, S., 0W Theobald, M., 1P Thomas, William, 0N Tillkorn, Christoph, 0G Tsubaki, Alfred, 0N, 0Q Voisiat, B., 0S, 0W Volpe, Annalisa, 0E Wang, Brian, 1A Watanabe, Akira, 12 Weller, Manuel, 1D Wickenhagen, S., 14 Yin, Gufan, 0X Yu, Xi, 1L Yu, Xiaoming, 1R Zagoranskiy, I., 0T Zeller, Thomas, 0G Zhang, Jie, 1A Zhao, Jay, 1A Zhou, Boyang, 1R Zimmer, K., 0T Zimmermann, Felix, 16, 1G Zuhlke, Craig A., 0N, 0Q Zwahr, C., 0S Conference CommitteeSymposium Chairs
Symposium Co-chairs
Program Track Chairs
Conference Chair Conference Co-chairs Conference Program Committee
Session Chairs
IntroductionThe Laser-based Micro- and Nanoprocessing conference brings together researchers and engineers from scientific and academic institutions and industry in order to provide a platform for mutual and fruitful discussion on application-oriented, cutting-edge research fields. The scope of relevant applications covers the fabrication of electronic, photonic, mechanical, chemical, bio-active, and bio-compatible devices. Because of the strong economic demands, laser materials processing is playing increasingly important roles in areas covered by the LBMP conference. Advanced laser-based processes for micro- and nano-processing are strongly demanded by high-tech industries for specialized prototypes and high throughput devices with micro- and nanostructures to realize electronic, photonics, mechanical, fluidic, chemical, and biological functionalities. However, the realization of such prototypes and devices for industrial manufacturing imposes new challenges for laser sources and beam propagation and beam modifications. The laser-induced modification of material properties at micro- or nano scales becomes more and more important in industrial applications where undesired material and surface modification such as chemical or heat-affected structural change must be avoided. Decrease the production costs or significant changes of established production lines are the challenges for the future industrial implementation. Therefore, both high-performance new products and innovations for high efficiency/high-throughput manufacturing and assembly technologies are the focus of the conference. The conference LBMP XIII was held on 5-7 February as a part of LASE 2019 at Photonics West in San Francisco, California. LBMP-XIII comprised around 60 presentations and posters which were presented by speakers from Belgium, China, France, Germany, Italy, Japan, Netherland, Lithuania, Singapore, Spain, Turkey, UK, and USA. Presentations represented a wide number of topics including: laser micro- and nano processing, ultrashort pulsed laser processing, direct-write processing and surface-modification, beam modification and additive manufacturing. Laser-based micro- and Nano processing were highlighted in sessions with micro- and nano- processing of several kinds of materials and high speed laser beam engineering systems talks. All sessions included topics very interesting for many scientific communities at universities and research institutes. At the same time, many industrial applications have a background of micro- and nano processing or optical background. We would like to express our deepest gratitude to the program committee members and the SPIE technical staff for their great efforts during the planning and organization of LBMP-XIII We would also like to thank the invited speakers and presenters of the contributed papers for their contribution to the success of this conference. All the manuscripts were reviewed to ensure the quality of the conference proceedings. Udo Klotzbach Akira Watanabe Rainer Kling |
