Maskless nanolithography on the basis of microfocus x-ray tubes: conversion of electron energy into the BeKα line

N. I. Chkhalo; A. Ya. Lopatin; A. E. Pestov; N. N. Salashchenko; G. D. Demin; N. A. Dyuzhev; M. A. Makhiboroda

doi:10.1117/12.2522105

15 March 2019 Maskless nanolithography on the basis of microfocus x-ray tubes: conversion of electron energy into the BeKα line

N. I. Chkhalo, A. Ya. Lopatin, A. E. Pestov, N. N. Salashchenko, G. D. Demin, N. A. Dyuzhev, M. A. Makhiboroda

Author Affiliations +

Proceedings Volume 11022, International Conference on Micro- and Nano-Electronics 2018; 110221M (2019) https://doi.org/10.1117/12.2522105
Event: The International Conference on Micro- and Nano-Electronics 2018, 2018, Zvenigorod, Russian Federation

Abstract

The article describes the status of work on the project of maskless x-ray nanolithography using a chip of transmission microfocus X-ray tubes with field emission cathodes as a dynamic mask device. The basic principles of this method of projection photolithography are considered, and the estimations of the expected throughput of the process are given. A noticeable part of the article is devoted to a model for numerical simulation of the emission characteristics of thin film targets at their exitation with a low energy electrons beam. The experimental results on measurements of the conversion efficiency of electrons energy into soft X-ray radiation of berillium Kα line (λ=11.4 nm) are presented. Other promising materials which could be used as efficient film targets for the mentioned design of maskless nanolithography are proposed.

Citation Download Citation

N. I. Chkhalo, A. Ya. Lopatin, A. E. Pestov, N. N. Salashchenko, G. D. Demin, N. A. Dyuzhev, and M. A. Makhiboroda "Maskless nanolithography on the basis of microfocus x-ray tubes: conversion of electron energy into the BeKα line", Proc. SPIE 11022, International Conference on Micro- and Nano-Electronics 2018, 110221M (15 March 2019); https://doi.org/10.1117/12.2522105

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