A comparison of customized Hartmann and newly introduced inverted Hartmann masks for single-shot phase-contrast X-ray imaging

M. Zakharova; S. Reich; A. Mikhaylov; V. Vlnieska; Marcus Zuber; Sabine Engelhardt; T. Baumbach; D. Kunka

doi:10.1117/12.2520723

26 April 2019 A comparison of customized Hartmann and newly introduced inverted Hartmann masks for single-shot phase-contrast X-ray imaging

M. Zakharova, S. Reich, A. Mikhaylov, V. Vlnieska, Marcus Zuber, Sabine Engelhardt, T. Baumbach, D. Kunka

Author Affiliations +

Proceedings Volume 11032, EUV and X-ray Optics: Synergy between Laboratory and Space VI; 110320U (2019) https://doi.org/10.1117/12.2520723
Event: SPIE Optics + Optoelectronics, 2019, Prague, Czech Republic

Abstract

In this contribution, we compare the performance of Hartmann masks and inverted Hartmann masks of different periods for phase-sensitive X-ray imaging. The Hartmann masks were gold meshes and the inverted Hartmann masks were arrays of gold pillars, both manufactured by UV lithography and gold electroforming on low-absorbing graphite substrates. We asses masks performance by comparing the visibility and homogeneity of the periodic patterns. Manufactured customized masks exhibit clear periodic patterns and demonstrate visibility values from 30 % to 50 % depending on the setup configuration. Finally, we show the phase contrast imaging with an angular resolution of 1.5 μm and demonstrate that images obtained with an inverted Hartmann mask have superior quality.

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M. Zakharova, S. Reich, A. Mikhaylov, V. Vlnieska, Marcus Zuber, Sabine Engelhardt, T. Baumbach, and D. Kunka "A comparison of customized Hartmann and newly introduced inverted Hartmann masks for single-shot phase-contrast X-ray imaging", Proc. SPIE 11032, EUV and X-ray Optics: Synergy between Laboratory and Space VI, 110320U (26 April 2019); https://doi.org/10.1117/12.2520723

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KEYWORDS

Photomasks

Visibility

X-rays

Sensors

Gold

Photoresist materials

X-ray imaging

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