Presentation + Paper
29 September 2019 Novel cleaning technology for nanoparticle removal
Author Affiliations +
Abstract
It’s generally said that the management of particles is important. In DUV lithography, it’s needed to remove particles on photomask surface not to induce patterning defects on wafer. Moreover, in Nanoimprint lithography (NIL), particles on template cause not only patterning defects on wafer but also its own pattern collapse. Therefore, these particles have to be entirely removed from substrate surface with cleaning technology. In this paper, we proposed ‘Freeze Cleaning’ which has more than 99% PRE for 40nm SiN standard nanoparticle without pattern collapse and critical dimension (CD) shift. And it was also demonstrated that soft defects on template which remained after conv. cleaning could be removed with Freeze Cleaning. These results predict that Freeze Cleaning will contribute to progress of photomask and template technology to next stage.
Conference Presentation
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mana Tanabe, Kosuke Takai, Kyo Otsubo, Kaori Umezawa, Minako Iinuma, Hideaki Sakurai, and Shingo Kanamitsu "Novel cleaning technology for nanoparticle removal", Proc. SPIE 11148, Photomask Technology 2019, 111480N (29 September 2019); https://doi.org/10.1117/12.2536471
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CITATIONS
Cited by 1 scholarly publication.
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KEYWORDS
Particles

Photomasks

Nanoparticles

Liquids

Nanotechnology

Inspection

Lithography

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