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23 March 2020 Study of lithographic characteristics due to differences in novolac resin structure
Atsushi Sekiguchi, Hatsuyuki Tanaka D.D.S., Hiroko Minami D.D.S., Yoko Matsumoto D.D.S., Makoto Hanabata D.D.S.
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Proceedings Volume 11326, Advances in Patterning Materials and Processes XXXVII; 113261S (2020) https://doi.org/10.1117/12.2550317
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States
Abstract
Our earlier studies pointed to a strong correlation between the molecular weight of novolac resin and lithographic characteristics. In particular, they showed that the resolution and DOF characteristics of resists may be improved by controlling molecular weight distribution. The present study focuses on photoactive compound (PAC) structure and resin structure. This paper discusses the effects of differences in PAC ballast structure and the composition of m-cresol (metacresol), p-cresol (para-cresol), and xylenol, phenolic monomers that constitute novolac resin, on resolution and lithographic characteristics, based on development rates and resist pattern simulations.
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Atsushi Sekiguchi, Hatsuyuki Tanaka D.D.S., Hiroko Minami D.D.S., Yoko Matsumoto D.D.S., and Makoto Hanabata D.D.S. "Study of lithographic characteristics due to differences in novolac resin structure", Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 113261S (23 March 2020); https://doi.org/10.1117/12.2550317
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KEYWORDS
Picture Archiving and Communication System
Molecules
Scanning electron microscopy
Photoresist developing
Hydrogen
Molecular interactions
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