Ultra-Precise Mask Metrology - Development And Practical Results Of A New Measuring Machine

H. Feindt; D. Sofronijevic

doi:10.1117/12.961756

11 October 1989 Ultra-Precise Mask Metrology - Development And Practical Results Of A New Measuring Machine

H. Feindt, D. Sofronijevic

Proceedings Volume 1138, Optical Microlithography and Metrology for Microcircuit Fabrication; (1989) https://doi.org/10.1117/12.961756
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France

Abstract

As circuits with sub-micron structures continue to increase in complexity, previous methods of inspecting overlay and CD tolerances are proven inadequate. Therefore, sponsored by the West German Ministry for Research and Technology, Wild Leitz developed a mask measurement system that represents in terms of achievable accuracy the limit of what is technically possible today. Within this project, Siemens as one of the key customers has performed part of the accuracy tests on a prototype of the machine and is now using a final system in its mask production line with good results.

Citation Download Citation

H. Feindt and D. Sofronijevic "Ultra-Precise Mask Metrology - Development And Practical Results Of A New Measuring Machine", Proc. SPIE 1138, Optical Microlithography and Metrology for Microcircuit Fabrication, (11 October 1989); https://doi.org/10.1117/12.961756

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