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22 February 2021 Design of block copolymers for directed self-assembly
Paul F. Nealey
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Proceedings Volume 11610, Novel Patterning Technologies 2021; 116100K (2021) https://doi.org/10.1117/12.2584926
Event: SPIE Advanced Lithography, 2021, Online Only
Abstract
Design rules for block copolymer (BCP) materials used in directed self-assembly (DSA) to meet the constraints for manufacturing were defined in a combined experimental and theoretical approach to quantitative three-dimensional characterization of nanoscale structure and analysis of defect annihilation kinetics and mechanisms. Subsequently we developed a materials platform based on (A-block-(B-random-C) architectures to satisfy those design rules to enable current and future patterning resolution requirements. We realize feature size-specific BCPs (18 to 8 nm full pitch) with balanced block surface energies between blocks for thermal annealing, controllable segregation strength for simultaneous optimization of defectivity and dimensional uniformity, and etch selectivity.
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Paul F. Nealey "Design of block copolymers for directed self-assembly", Proc. SPIE 11610, Novel Patterning Technologies 2021, 116100K (22 February 2021); https://doi.org/10.1117/12.2584926
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KEYWORDS
Directed self assembly
Annealing
Etching
Manufacturing
Optical lithography
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