Photomask challenges for data-centric computing in the 2020s

Klaus Schuegraf

doi:10.1117/12.2607440

23 August 2021 Photomask challenges for data-centric computing in the 2020s

Klaus Schuegraf

Author Affiliations +

Proceedings Volume 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology; 1190802 (2021) https://doi.org/10.1117/12.2607440
Event: Photomask Japan 2021, 2021, Online Only

Abstract

The world is rapidly shifting towards data-centric computing model with significant growth in compute, storage and networking. Moore’s law scaling to reduce power, improve performance and reduce area and cost per transistor to support data centric growth places significant challenges for photomask process, control, and metrology. DUV lithography continues to be workhorse technology and continues to drive innovation. Multiple solutions are being developed to solve DUV mask challenges associated with a big die requirement. While DUV production is being projected to be strong for next few years, EUV is picking up pace and being deployed in high volume manufacturing. EUV is an opportunity-rich environment for improvements and innovations that will continue to advance the journey. EUV HiNA is a major step in the lithography paradigm where 0.55 NA EUV optics will enable a shift to sub-10nm resolution. The HiNA mask ecosystem will adapt by growing the newly created low NA EUV supply chain into new directions. The photomask environment will continue to bring creativity, drive innovations and gain commercial rewards.

Citation Download Citation

Klaus Schuegraf "Photomask challenges for data-centric computing in the 2020s", Proc. SPIE 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1190802 (23 August 2021); https://doi.org/10.1117/12.2607440

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KEYWORDS

Photomasks

Extreme ultraviolet

Deep ultraviolet

Ecosystems

Inspection

Lithography

Pellicles

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