Characteristics of fine feature hole templates for nanoimprint lithography toward 2nm and beyond

Koji Ichimura; Koji Yoshida; Hideki Cho; Ryugo Hikichi; Masaaki Kurihara

doi:10.1117/12.2643250

1 December 2022 Characteristics of fine feature hole templates for nanoimprint lithography toward 2nm and beyond

Koji Ichimura, Koji Yoshida, Hideki Cho, Ryugo Hikichi, Masaaki Kurihara

Author Affiliations +

Proceedings Volume 12293, Photomask Technology 2022; 122930F (2022) https://doi.org/10.1117/12.2643250
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

Nanoimprint lithography, NIL, is an attractive lithography technique for fine feature pattern fabrication, simple process and low cost of ownership. NIL templates play an important role because templates define the resolution of NIL process. In this paper we discussed fine feature hole template fabrication and their performance such as CD uniformity and image placement along with the feature size and duty ratio. In addition, we proposed to apply LELE(Litho-Etch-Litho-Etch) method to fabricate fine feature hole templates and discussed their performances.

Conference Presentation

Citation Download Citation

Koji Ichimura, Koji Yoshida, Hideki Cho, Ryugo Hikichi, and Masaaki Kurihara "Characteristics of fine feature hole templates for nanoimprint lithography toward 2nm and beyond", Proc. SPIE 12293, Photomask Technology 2022, 122930F (1 December 2022); https://doi.org/10.1117/12.2643250

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