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31 January 2023 Growth of Ge1-xSnx alloys for MWIR sensing applications
Bruce Claflin, Gordon Grzybowski, Joshua Duran
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Proceedings Volume 12477, International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors 2022; 124770M (2023) https://doi.org/10.1117/12.2647373
Event: International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors, 2022, Boston, Massachusetts, United States
Abstract
Films of Ge1-xSnx have been grown on Ge, Si, and Al2O3 substrates by remote plasmaenhanced chemical vapor deposition with Sn concentrations greater than 10% and thicknesses greater than 1 μm. Characterization data of the structural, optical, and electrical properties of these alloys are presented. Device characteristics from planar photoconductor and vertical p-n devices grown directly on Si substrates show promise for future MWIR sensing applications.
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Bruce Claflin, Gordon Grzybowski, and Joshua Duran "Growth of Ge1-xSnx alloys for MWIR sensing applications", Proc. SPIE 12477, International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors 2022, 124770M (31 January 2023); https://doi.org/10.1117/12.2647373
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KEYWORDS
Mid-IR
Silicon
Germanium
Photoresistors
Plasma enhanced chemical vapor deposition
Tin
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