The damage control of sub layer while ion-driven etching with vertical carbon profile implemented

SeungJin Mun; Lina Yoo; Jongdeok Hong; Junyeong Ahn; Kyung-yub Jeon; Keunhee Bai

doi:10.1117/12.2657249

1 May 2023 The damage control of sub layer while ion-driven etching with vertical carbon profile implemented

SeungJin Mun, Lina Yoo, Jongdeok Hong, Junyeong Ahn, Kyung-yub Jeon, Keunhee Bai

Proceedings Volume 12499, Advanced Etch Technology and Process Integration for Nanopatterning XII; 124990J (2023) https://doi.org/10.1117/12.2657249
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Conference Poster

Abstract

As device scale down to sub 3nm, NMOS/PMOS boundary patterning becomes critical in logic product. This patterning requires highly directional etching while maintaining high selectivity to the base metal layer. In this paper, we demonstrated that the ion energy has the trade-off between the profile verticality and the surface damage. The ion energy was strongly controlled by the bias voltage and surface damage was improved with lower bias voltage, but profile verticality was deteriorated because of the ion angle dispersion. To enhance the profile verticality the carbon rich gas was added as the top passivation. The proposed method will be a practical in sub-3nm logic boundary patterning.

Citation Download Citation

SeungJin Mun, Lina Yoo, Jongdeok Hong, Junyeong Ahn, Kyung-yub Jeon, and Keunhee Bai "The damage control of sub layer while ion-driven etching with vertical carbon profile implemented", Proc. SPIE 12499, Advanced Etch Technology and Process Integration for Nanopatterning XII, 124990J (1 May 2023); https://doi.org/10.1117/12.2657249

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