Research on Z-cut quartz wet etching technology

Pengfei Zhang

doi:10.1117/12.2673056

10 April 2023 Research on Z-cut quartz wet etching technology

Pengfei Zhang

Proceedings Volume 12614, 14th International Photonics and Optoelectronics Meetings (POEM 2022); 126140B (2023) https://doi.org/10.1117/12.2673056
Event: 14th International Photonics and Optoelectronics Meeting (POEM 2022), 2022, Wuhan, China

Abstract

Quartz has the characteristics of piezoelectricity, insulation, light transmission, high hardness, etc., and has great potential for development, especially devices based on single crystal quartz materials are widely used in various sensors. The development of quartz MEMS devices in the direction of miniaturization and high integration puts forward higher requirements for the micro-nano processing technology of quartz. The main processing techniques of quartz MEMS devices are mechanical processing, dry etching and wet etching; mechanical processing is difficult to break through the bottleneck of accuracy and size; dry etching requires a thick enough mask and is difficult to prepare; wet etching rate High, the process is simple and easy to control, and the cost is low, especially for the processing of irregular and complex three-dimensional structures such as cavities, sharp corners, high aspect ratio sidewalls, cantilever beams, etc., especially for anisotropic wet etching. At the same time, the interface will not cause physical damage to the material itself, which can ensure the stability of the quartz MEMS device. This paper focuses on the wet etching process of Z-cut quartz to optimize the wet etching rate and surface roughness for MEMS devices.

Citation Download Citation

Pengfei Zhang "Research on Z-cut quartz wet etching technology", Proc. SPIE 12614, 14th International Photonics and Optoelectronics Meetings (POEM 2022), 126140B (10 April 2023); https://doi.org/10.1117/12.2673056

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