Paper
1 June 1990 Advances in deep-UV lithography
Setha G. Olson, Christopher Sparkes
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Abstract
No abstract available.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Setha G. Olson and Christopher Sparkes "Advances in deep-UV lithography", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); https://doi.org/10.1117/12.20204
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Distortion

Lithography

Signal to noise ratio

Deep ultraviolet

Optical lithography

Lens design

Excimer lasers

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