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Since Multiphoton Lithography (MPL) is applied as an additive manufacturing technique for the fabrication of operational microsystems, the need to predict the mechanical response of the fabricated structures emerges. This work focuses on determining the Young’s Modulus of structures fabricated via MPL. With this objective in mind, two series of experiments were designed and conducted: the first one for the determination of the factors whose impact is significant, and the second one for generating a dataset used in the training of a machine learning tool that will define the suitable set of fabrication parameters for the fabrication of a structure with desired Young’s Modulus.
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Stefanos Mavrikos andCostas P. Grigoropoulos
"Tuning Young’s modulus in multiphoton lithography", Proc. SPIE 12874, Nanoscale and Quantum Materials: From Synthesis and Laser Processing to Applications 2024, 1287407 (12 March 2024); https://doi.org/10.1117/12.3005653
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Stefanos Mavrikos, Costas P. Grigoropoulos, "Tuning Young’s modulus in multiphoton lithography," Proc. SPIE 12874, Nanoscale and Quantum Materials: From Synthesis and Laser Processing to Applications 2024, 1287407 (12 March 2024); https://doi.org/10.1117/12.3005653