Expert system diagnosis of CMOS VLSI fabrication problems

Thomas E. Sullivan; Brian P. Butz; Robert J. Schuhl

doi:10.1117/12.21053

1 January 1990 Expert system diagnosis of CMOS VLSI fabrication problems

Thomas E. Sullivan, Brian P. Butz, Robert J. Schuhl

Proceedings Volume 1293, Applications of Artificial Intelligence VIII; (1990) https://doi.org/10.1117/12.21053
Event: 1990 Technical Symposium on Optics, Electro-Optics, and Sensors, 1990, Orlando, FL, United States

Abstract

TEMPIC is a diagnostic expert system capable of providing process and device engineers with real time assistance in determining the origin of CMOS fabrication faults. The increased complexity of 1.25 and submicron CMOS processes presents the device engineer with large statistical data bases in which parametric relationships and dependencies must be analyzed and correlated. Corrective action is then initiated to remedy the identified process fault. The TEMPIC expert system functions as an advisor to the device engineer. Numerical data is gathered and is assigned qualitative descriptors with respect to the deviation of the experimental data from the process specification. Three related but independent data bases are used: Process control data, on-chip critical dimension data, and parametric electrical data. In this paper we discuss the knowledge engineering methodology used in developing the rules for the system and the way in which the system diagnostic architecture evolved from those sessions. The method by which the expert system determines candidate faults is presented. In cases where several possible faults are identified an interactive dialogue is initiated.

Citation Download Citation

Thomas E. Sullivan, Brian P. Butz, and Robert J. Schuhl "Expert system diagnosis of CMOS VLSI fabrication problems", Proc. SPIE 1293, Applications of Artificial Intelligence VIII, (1 January 1990); https://doi.org/10.1117/12.21053

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