Open Access Paper
24 April 2024 Front Matter: Volume 12953
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 12953, including the Title Page, Copyright information, Table of Contents, and Conference Committee information.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in Optical and EUV Nanolithography XXXVII, edited by Martin Burkhardt, Claire van Lare, Proc. of SPIE 12953, Seven-digit Article CID Number (DD/MM/YYYY); (DOI URL).

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510672123

ISBN: 9781510672130 (electronic)

Published by

SPIE

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Copyright © 2024 Society of Photo-Optical Instrumentation Engineers (SPIE).

Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of fees. To obtain permission to use and share articles in this volume, visit Copyright Clearance Center at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher.

Printed in the United States of America by Curran Associates, Inc., under license from SPIE.

Publication of record for individual papers is online in the SPIE Digital Library.

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Paper Numbering: A unique citation identifier (CID) number is assigned to each article in the Proceedings of SPIE at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Conference Committee

Symposium Chair

  • Qinghuang Lin, Linktech, Inc. (United States)

Symposium Co-chair

  • John C. Robinson, KLA Corporation (United States)

Conference Chair

  • Martin Burkhardt, IBM Thomas J. Watson Research Center (United States)

Conference Co-chair

  • Claire van Lare, ASML Netherlands B.V. (Netherlands)

Conference Program Committee

  • Christopher Neil Anderson, Lawrence Berkeley National Laboratory (United States)

  • Steven L. Carson, Intel Corporation (United States)

  • Will Conley, Cymer, LLC (United States)

  • Huixiong Dai, Applied Materials, Inc. (United States)

  • Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)

  • Allen H. Gabor, IBM Thomas J. Watson Research Center (United States)

  • Andreas Greiner, Infineon Technologies Dresden GmbH (Germany)

  • Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)

  • Soichi Inoue, KIOXIA Corporation (Japan)

  • Young Seog Kang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)

  • Bryan S. Kasprowicz, HOYA Corporation USA (United States)

  • Insung Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)

  • Toshio Konishi, Toppan Photomasks, Inc. (Japan)

  • Ted Liang, Intel Corporation (United States)

  • Chang-Moon Lim, SK Hynix, Inc. (Korea, Republic of)

  • Luciana Meli, IBM Thomas J. Watson Research Center (United States)

  • Lawrence S. Melvin III, Synopsys, Inc. (United States)

  • Hakaru Mizoguchi, Gigaphoton Inc. (Japan)

  • Iacopo Mochi, Paul Scherrer Institut (Switzerland)

  • Ken-Ichiro Mori, Canon Inc. (Japan)

  • Patrick P. Naulleau, The Center for X-Ray Optics (United States)

  • Jens Timo Neumann, Carl Zeiss SMT GmbH (Germany)

  • Soichi Owa, Nikon Corporation (Japan)

  • Vicky Philipsen, imec (Belgium)

  • Moshe E. Preil, Carl Zeiss AG (United States)

  • Katrina Rook, Veeco Instruments Inc. (United States)

  • Bruce W. Smith, Rochester Institute of Technology (United States)

  • Regina Soufli, Consultant (United States)

  • Akiyoshi Suzuki, Gigaphoton Inc. (Japan)

  • Anna Tchikoulaeva, Lasertec U.S.A., Inc. Zweigniederlassung Deutschland (Germany)

  • Edita Tejnil, Siemens EDA (United States)

  • Geert Vandenberghe, imec (Belgium)

  • Thomas I. Wallow, ASML (United States)

  • Obert R. Wood II, Retired (United States)

  • Kenji Yamazoe, TSMC North America (United States)

© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 12953", Proc. SPIE 12953, Optical and EUV Nanolithography XXXVII, 1295301 (24 April 2024); https://doi.org/10.1117/12.3031868
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KEYWORDS
Extreme ultraviolet lithography

Imaging systems

Optical lithography

Stochastic processes

3D image processing

Digital image processing

Digital Light Processing

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