Presentation + Paper
10 April 2024 Cloud flight plan for post-tapeout flow jobs
Pascal Gilgenkrantz, Bassem Riad, Maram Salah, Azim Siddique
Author Affiliations +
Abstract
Advanced computational lithography requires growing compute power and increased flexibility which can be easily accessed on Cloud. We’ll present solutions developed to allow Calibre semiconductor manufacturing PTOF jobs to leverage Cloud massive compute power seamlessly and cost-effectively. An OPC–MPC–MDP PTOF flow launched under Siemens EDA Reference Environment for AWS will demonstrate the following optimizations: keep Cloud instances busy and provide best runtime by dynamically scaling the jobs and the cluster size; use AWS spot instances seamlessly; monitor jobs and hardware at the same time to fine-tune cloud instance types; reach massive scalability using Calibre FullScale.
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Pascal Gilgenkrantz, Bassem Riad, Maram Salah, and Azim Siddique "Cloud flight plan for post-tapeout flow jobs", Proc. SPIE 12954, DTCO and Computational Patterning III, 129540O (10 April 2024); https://doi.org/10.1117/12.3010142
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KEYWORDS
Clouds

Electronic design automation

Optical proximity correction

Simulations

Lithography

Computer hardware

Organization management

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