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18 June 2024 Stress birefringence in optical systems: simulation and analysis
João Mendes-Lopes, Stefano Guazzotti, Michael Cheng, Matthias Schlich, Chris Normanshire, Esteban F. Carbajal
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Proceedings Volume 13019, Optical Design and Engineering IX; 130191L (2024) https://doi.org/10.1117/12.3022953
Event: SPIE Optical Systems Design, 2024, Strasbourg, France
Abstract
Stress birefringence may lead to appreciable wavefront and polarization errors, especially in polarization sensitive systems. The effect is becoming increasingly important, as complex polarization-dependent and polymer-based optical systems become more prevalent, impacting imaging quality in systems such as Augmented and Virtual Reality. Advancements in multiphysics simulation, including the combination of Finite Element Analysis and optical simulation, enable optical designers to simulate and assess the effect of stress birefringence in the final performance of the optical system. We have developed a simulation method that combines 3D fitting of FEA non-uniform stress data with non-uniform gradient index ray tracing, calculating the polarization and wavefront error from the propagation of the wavefront through the system. We demonstrate the model with practical examples, in which we analyze the impact of stress birefringence on the polarization and image quality. The robustness of the technology is demonstrated with different types of stress data and optical systems.
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João Mendes-Lopes, Stefano Guazzotti, Michael Cheng, Matthias Schlich, Chris Normanshire, and Esteban F. Carbajal "Stress birefringence in optical systems: simulation and analysis", Proc. SPIE 13019, Optical Design and Engineering IX, 130191L (18 June 2024); https://doi.org/10.1117/12.3022953
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KEYWORDS
Birefringence
Optical simulations
Polarization
Finite element methods
Equipment
GRIN lenses
Image quality
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