Application of steeply-curved free-form x-ray mirror fabrication process to a high-precision plane surface

T. Kume; Y. Matsuzawa; Y. Imamura; K. Hiraguri; H. Motoyama; S. Egawa; H. Mimura; H. Hashizume

doi:10.1117/12.3028501

4 October 2024 Application of steeply-curved free-form x-ray mirror fabrication process to a high-precision plane surface

T. Kume, Y. Matsuzawa, Y. Imamura, K. Hiraguri, H. Motoyama, S. Egawa, H. Mimura, H. Hashizume

Author Affiliations +

Proceedings Volume 13150, Advances in X-Ray/EUV Optics and Components XIX; 1315002 (2024) https://doi.org/10.1117/12.3028501
Event: Optical Engineering + Applications, 2024, San Diego, California, United States

Abstract

Steeply curved free-form x-ray mirrors, represented by monolithic ellipsoidal or Wolter mirrors, are required for submicron focusing without chromatic aberrations in the soft x-ray region. Such mirrors require a different approach to surface machining and metrology than conventional mirrors with small sags, such as Kirkpatrick-Baez or plane mirrors. A few examples of the fabrication of Wolter mirrors have been reported, in which surface measurements using a surface profilometer with a contact probe were used for figure correction. However, owing to differences in measurement methods and fabrication difficulties, the fabrication performance has not been fully evaluated on a comparative basis. In this study, a high-precision plane mirror was fabricated using the same process as that used for steeply curved free-form mirrors. The figure measurement accuracy was comparatively evaluated, and the results suggested the possibility of achieving a figure accuracy of 5nm in PV and 0.7nm in RMS in steeply curved free-form mirror fabrication.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

T. Kume, Y. Matsuzawa, Y. Imamura, K. Hiraguri, H. Motoyama, S. Egawa, H. Mimura, and H. Hashizume "Application of steeply-curved free-form x-ray mirror fabrication process to a high-precision plane surface", Proc. SPIE 13150, Advances in X-Ray/EUV Optics and Components XIX, 1315002 (4 October 2024); https://doi.org/10.1117/12.3028501

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