Ion-beam figuring (IBF) capable of providing sub-nanometer shape accuracy, is often used for fabrication of ultra-precise x-ray optics. However, in the case of gratings, the optical surface may degrade during the following ruling procedure or etching processes. This leads to the necessity for a post-ruling surface correction to recover the ultra-precise shape of the optics, while the IBF substrate finish prior the ruling could be omitted. If so, the gratings can be made using relatively inexpensive substrates produced with conventional mechanical or chemical-mechanical polishing with medium optical surface quality and then processed with a post-ruling IBF to bring the shape to the sub-nanometer accuracy. The key question is whether the grating grooves survive the IBF treatment. In this work we investigate the possibility of post-production IBF correction for lamellar x-ray gratings. A 200 lines/mm lamellar grating made using a lambda/20 Si substrate was processed with IBF to achieve a sub-nanometer flat optical surface of the final grating. We report on impact of the IBF process on groove profile, surface roughness, and diffraction efficiency of the grating.
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