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LI the photolithography is combined with holography a new phaseonly relief hologram can be produced. The method that increase modulation index and diffraction efficiency by controlled the etching condition and experiment result are reported in this paper. This method has new application prospects. i
Yongkang Guo,Lurong Guo, andXiao-Chun Zhang
"New method of improving the modulation of holograms", Proc. SPIE 1319, Optics in Complex Systems, (1 July 1990); https://doi.org/10.1117/12.22164
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Yongkang Guo, Lurong Guo, Xiao-Chun Zhang, "New method of improving the modulation of holograms," Proc. SPIE 1319, Optics in Complex Systems, (1 July 1990); https://doi.org/10.1117/12.22164