Modification of polysilsesquioxane curing for use in anti-reflective coatings

Alan Ramirez; Justin Kerszulis; Marcus Monticelli; Raluca Negres; Alice Wong

doi:10.1117/12.3033003

17 December 2024 Modification of polysilsesquioxane curing for use in anti-reflective coatings

Alan Ramirez, Justin Kerszulis, Marcus Monticelli, Raluca Negres, Alice Wong

Author Affiliations +

Proceedings Volume 13190, Laser-Induced Damage in Optical Materials 2024; 131900N (2024) https://doi.org/10.1117/12.3033003
Event: SPIE Laser Damage, 2024, San Ramon, CA, United States

Abstract

In this work we showcase the formulation of an anti-reflective (AR), UV/ozone-curable polysilsesquioxane or glass resin (GR) system with a high laser damage threshold suitable for Third-Harmonic Generator (THG) optics. Potassium Dideuterium Phosphate (DKDP) single crystals are used for these non-linear optics at the National Ignition Facility (NIF). However, DKDP is thermally sensitive making it crucial to avoid elevated thermal conditions, therefore UV/ozone-curing glass resins are the optimal choice. The commercial GR, utilized in this study was specifically engineered to undergo complete curing during UV processing, while also offering the flexibility of a low thermal cure at temperatures below 100 °C. UV/ozone exposure resulted in a significant loss of methyl silane peaks and a thermally cured network formed a total reduction of R-OH & Si-OH peaks. Laser damage testing confirmed equivalent damage-resistance for each network based on their curing condition. The newly formulated GR is a highly shelf-stable solution that allows peak optical performance on large-high-power laser systems where unique optics and operating conditions exist.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Alan Ramirez, Justin Kerszulis, Marcus Monticelli, Raluca Negres, and Alice Wong "Modification of polysilsesquioxane curing for use in anti-reflective coatings", Proc. SPIE 13190, Laser-Induced Damage in Optical Materials 2024, 131900N (17 December 2024); https://doi.org/10.1117/12.3033003

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