Monotonic machine learning for lithography retargeting layer generation by leveraging contour-based metrology

Yuansheng Ma; Haizhou Yin; Le Hong; Xuefeng Zeng; Xiaomei Li; Hongming Zhang; Jeongmi Lee; Xiaoyuan Qi; Neal Lafferty; Germain Fenger; George Lippincott; Jiechang Hou; Abdulrazaq Adams; Xima Zhang; Yuyang Sun; Danping Peng; Renyang Meng; Werner Gillijns

doi:10.1117/12.3034720

13 November 2024 Monotonic machine learning for lithography retargeting layer generation by leveraging contour-based metrology

Yuansheng Ma, Haizhou Yin, Le Hong, Xuefeng Zeng, Xiaomei Li, Hongming Zhang, Jeongmi Lee, Xiaoyuan Qi, Neal Lafferty, Germain Fenger, George Lippincott, Jiechang Hou, Abdulrazaq Adams, Xima Zhang, Yuyang Sun, Danping Peng, Renyang Meng, Werner Gillijns

Author Affiliations +

Proceedings Volume 13216, Photomask Technology 2024; 132161V (2024) https://doi.org/10.1117/12.3034720
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

This paper presents an innovative use of machine learning (ML) to improve etch modeling by integrating monotonic machine learning methods with ML-based contour metrology. Unlike traditional methods that rely on single gauge-based data, our approach leverages comprehensive contour data extracted from SEM images to predict etching biases. It handles large datasets efficiently and adapts dynamically to new data. A primary element of our strategy involves constructing a retargeting layer with etch bias, derived from features at multiple sites or points of interest (POIs) on a reference layer which is generated with a fuzzy clustering model. These features and their corresponding etch biases serve as training data for our semi-supervised model which will be used for prediction on large scale designs.

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Yuansheng Ma, Haizhou Yin, Le Hong, Xuefeng Zeng, Xiaomei Li, Hongming Zhang, Jeongmi Lee, Xiaoyuan Qi, Neal Lafferty, Germain Fenger, George Lippincott, Jiechang Hou, Abdulrazaq Adams, Xima Zhang, Yuyang Sun, Danping Peng, Renyang Meng, and Werner Gillijns "Monotonic machine learning for lithography retargeting layer generation by leveraging contour-based metrology", Proc. SPIE 13216, Photomask Technology 2024, 132161V (13 November 2024); https://doi.org/10.1117/12.3034720

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KEYWORDS

Etching

Machine learning

Metrology

Modeling

Contour extraction

Data modeling

Semiconductor manufacturing

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