Space station atomic-oxygen-resistant coatings

James L. Grieser; Alan W. Freeland; Jeffrey D. Fink; Gary E. Meinke; Eugene N. Hildreth

doi:10.1117/12.47522

1 January 1991 Space station atomic-oxygen-resistant coatings

James L. Grieser, Alan W. Freeland, Jeffrey D. Fink, Gary E. Meinke, Eugene N. Hildreth

Proceedings Volume 1330, Optical Surfaces Resistant to Severe Environments; (1991) https://doi.org/10.1117/12.47522
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

A Low Earth Orbit (LEO) Atomic Oxygen Resistant (AOR) thin film coating has been developed by Sheldahl Inc. for use on the Space Station Freedont Photo Voltaic Solar Array Panels. The AOR silicon oxide (SiOx) coating was developed in a irianufacturing system and lends itself to reasonably large production quantities. Test results of the SiOx coating on polyiinide versus uncoated polyiiaide are presented along with a discussion of the nanufacturing process used. The substrate used for this program was Dupont type H Kapton! The major areas of testing were environnental survivability (atomic oxygen resistance optical properties and thermal shock) and physical/mechanical characterization (adhesion blocking flexibility and abrasion resistance). 2.

Citation Download Citation

James L. Grieser, Alan W. Freeland, Jeffrey D. Fink, Gary E. Meinke, and Eugene N. Hildreth "Space station atomic-oxygen-resistant coatings", Proc. SPIE 1330, Optical Surfaces Resistant to Severe Environments, (1 January 1991); https://doi.org/10.1117/12.47522

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